Universite-Jobs in Frankreich

Organisation/Company CNRS Department Centre de Nanosciences et de Nanotechnologies Research Field Engineering Physics Technology Researcher Profile First Stage Researcher (R1) Country France Application Deadline 8 Dec 2025 - 23:59 (UTC) Type of Contract Temporary Job Status Full-time Hours Per Week 35 Offer Starting Date 1 Mar 2026 Is the job funded through the EU Research Framework Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No

We are looking for a highly motivated postdoctoral researcher to join our team and contribute to a project, dedicated to the study of elastic wave transport in microstructured silicon membranes. The researcher will be primarily responsible for the design and fabrication of suspended Si membranes using the state-of-the-art cleanroom facilities at C2N. The work will involve the development of advanced micro- and nanofabrication processes based on Silicon-On-Insulator (SOI) technology, including lithography, plasma etching, thin-film deposition, and membrane release. Particular attention will be given to the realization of periodic or microstructured patterns designed to control elastic wave propagation at gigahertz frequencies. The recruited postdoc will work in close collaboration with other members of the team who will perform the optical and acoustic characterization of the fabricated structures. This position offers an excellent opportunity to develop expertise in high-precision silicon microfabrication within a multidisciplinary research project combining nanotechnology, materials science, and wave physics.

• the development of advanced micro- and nanofabrication processes based on SOI (Silicon-On-Insulator) technology
• lithography
• plasma etching
• thin-film deposition
• membrane release
• fabrication of periodic or microstructured patterns designed to control elastic wave propagation

Silicon membranes fabricated from Silicon-On-Insulator (SOI) technology are highly versatile structures with numerous applications in microelectronics, MEMS (Microelectromechanical Systems), and nanotechnology. These membranes are produced by selectively etching the top silicon layer of SOI wafers to form suspended, free-standing films that can be only a few nanometers thick. Owing to their exceptional mechanical and electronic properties, such membranes provide ideal platforms for exploring nanoscale thermal transport, as well as for developing advanced optoelectronic and sensing functionalities. We aim to use these membranes to investigate elastic wave transport in microstructured materials. Our approach combines advanced nanofabrication with phase-engineered optical excitation to generate and visualize elastic waves with high spatial and temporal resolution. By designing and fabricating tailored phononic structures on suspended silicon platforms, we seek to demonstrate robust and localized wave propagation that remains stable even in the presence of structural imperfections. This fundamental work will contribute to advancing the understanding of elastic wave control in micro- and nanoscale systems.
The work will be performed at the Center for Nanoscience and Nanotechnologies (C2N). The C2N laboratory, is a renowned research centre at the forefront of nanoscience and nanotechnology, jointly supported by CNRS and Université Paris-Saclay. With state-of-the‑art facilities, including advanced cleanrooms, microscopy, and nanofabrication tools, C2N provides an exceptional environment for groundbreaking research. The lab fosters a multidisciplinary approach, bringing together researchers in physics, materials science, and engineering. As part of a vibrant scientific community, postdoctoral researchers will have the opportunity to engage in cutting‑edge projects, collaborate with leading experts, and contribute to innovative advancements in nanotechnology.

The candidate should have:

• PhD degree in Physics, Materials Science, Electrical Engineering, Nanotechnology, or a related field.
• Strong hands‑on experience in cleanroom micro‑and nanofabrication, ideally using Silicon‑On‑Insulator (SOI) substrates.
• Proficiency with key microfabrication techniques, including:
  • Photolithography and/or electron‑beam lithography
  • Dry and wet etching (RIE, ICP, KOH, HF, etc.)
  • Thin film deposition (PVD, PECVD)
• Familiarity with microscopy and characterization techniques (SEM, AFM, profilometry, ellipsometry, etc.).
• Ability to develop and optimize fabrication processes, document protocols, and ensure reproducibility.
• Ability to work independently while collaborating effectively within a multidisciplinary research team.
• Good communication skills in English (spoken and written); French is a plus but not required.
• A strong publication record in relevant scientific journals is an advantage.

Additional comments

ANR project "Topological Wave Transport in Elastic Metamaterials"