Engineer, Application Metrology

PALL FILTRATION PTE LTD; Singapore; On-site; SGD 70,000 - 90,000; Full time

Job summary

A leading filtration technology company in Singapore is seeking an Engineer, Application Metrology. This role involves owning the application metrology strategy for photolithography and wet etch chemistries, developing off-track test methods, and contributing to New Product Development programs. The ideal candidate will have a degree in Chemical Engineering and experience in analytical methods like ICP-MS and GC-MS. Excellent communication and leadership skills are essential, as well as the ability to travel domestically and internationally for project collaboration.

Benefits

Comprehensive health care

Paid time off

Qualifications

• Minimum 4 years of R&D or product development experience.
• Hands-on expertise in method development and validation.
• Proven ability to lead metrology projects independently.

Responsibilities

• Design and implement metrology systems for filter testing.
• Develop and validate analytical methods for detecting contaminants.
• Collaborate with global teams and provide technical reports.

Skills

ICP-MS expertise

GC-MS expertise

LC-MS/MS expertise

Statistical tools (DOE, MSA/GR&R, SPC)

Excellent communication skills

Education

BS in Chemical or Process Engineering

MS/PhD preferred

Tools

Analytical methods (ICP-MS, GC-MS, LC-MS/MS)

Job description

Job Summary

Engineer, Application Metrology is responsible to own the application metrology strategy for photolithography and wet etch chemistries, develop off‑track test methods that replicate fab conditions, and translate findings into product requirements for our rapidly growing Microelectronics business. You will also work independently drive research and New Product Development (NPD) programs, guide cross‑functional teams, and build capabilities that quantify filtration impact on wafer yield and defectivity.

This position reports to the R&D Supervisor, Science and is part of the Research and Development Team located in Benoi, Singapore and will be an on‑site role.

Key Responsibilities

• Design and implement metrology systems that replicate lithography track and wet etch environments outside the fab, enabling rapid filter concept iteration without tool time.
• Develop and validate ultra‑trace analytical methods (ICP‑MS, GC‑MS, LC‑MS/MS) to detect metals, ions, VOCs, oligomers, PAG fragments, and surfactants at sub‑ppb/ppt levels.
• Establish and execute filter challenge testing for photolithography and wet etch processes, defining test vehicles, chemistries, and stress profiles, and quantifying extractables/leachables and nanoparticles using complementary techniques.
• Apply advanced statistical tools (DOE, MSA/GR&R, SPC) to optimize processes, set specifications, and drive data‑based decisions.
• Collaborate with global teams across time zones, participate in occasional off‑hours calls, and travel up to 10% domestically and internationally.

Essential Qualifications

• BS in Chemical or Process Engineering (MS/PhD preferred) with minimum 4 years of R&D or product development experience, specifically in ultra‑trace application metrology for semiconductor or similarly demanding industries.
• Hands‑on expertise in ICP‑MS, GC‑MS, and LC‑MS/MS, including method development and validation (LOD/LOQ, linearity, recovery, matrix effects, carryover), with proven ability to operate, troubleshoot, and interpret data.
• Proven ability to lead metrology projects independently, delivering validated analytical methods and achieving detection limits at sub‑ppb/ppt levels.
• Strong track record applying statistical tools (DOE, MSA/GR&R, SPC) to optimize processes and establish specifications.
• Excellent communication skills, evidenced by clear technical reports and presentations to cross‑functional teams and senior leadership.

Preferred Experience

• Filter design, membrane science, fluid dynamics, and surface modification, as well as particle metrology techniques (OPC/LPC, NTA/DLS).
• Experience setting up new labs, including facility layout, UHP utilities, cleanliness protocols, and instrument qualification.
• Familiarity with semiconductor OEM or fab processes, with exposure to photolithography and wet etch chemistries.

Benefits

Pall Corporation offers a broad array of comprehensive, competitive benefit programs that add value to our lives, including health care and paid time off.

EEO Statement

Equal Opportunity Employer – All qualified applicants are encouraged to apply.