Optimization of inline SEM Cross-Section Preparation and Inspection

Imec; Vlaams-Brabant; On-site; EUR 10,000 - 17,000; Part time

Job summary

Imec in Leuven, Belgium is offering a Bachelor internship to optimize inline SEM cross-section workflows. The student will study sample capping, cross-section cutting and SEM imaging parameters, aiming to sharpen image quality and reliability for inline analysis.

The project defines objective quality criteria and develops standardized beam templates, contributing to metrology methods used in advanced semiconductor fabrication environments.

Qualifications

• Bachelor internship in relevant field.
• Experience with SEM or metrology is a plus.
• Strong analytical and documentation skills.

Responsibilities

• Develop and optimize a workflow for inline SEM cross-section inspections.
• Investigate sample capping, cross-section cutting and SEM imaging parameters (resolution, dwell time, line integration, image integration).
• Define objective image quality criteria based on experimental results.
• Create standardized pattern and beam templates for robust inline SEM analysis.
• Collaborate in a state-of-the-art semiconductor fabrication environment.

Education

Bioscience Engineering

Chemistry/Chemical Engineering

Materials Engineering

Job description

Optimization of inline SEM Cross-Section Preparation and Inspection

Optimizing inline SEM workflows for sharper, faster, and more reliable cross-section inspection

Scanning Electron Microscopy (SEM) is an essential metrology technique in semiconductor manufacturing, enabling high-resolution imaging of device structures and material layers. Both top-view and cross-sectional SEM inspections are widely used to monitor process quality and support technology development.

This thesis focuses on developing and optimizing a workflow for inline SEM cross-section inspections. The student will investigate and optimize the key preparation and inspection steps, including sample capping, cross-section cutting, and SEM imaging. Various imaging parameters such as pixel resolution, dwell time, line integration, and image integration will be evaluated to determine their impact on image quality.

Based on experimental results, objective image quality criteria will be defined and used to identify the optimal inspection conditions. The student will also develop standardized pattern and beam templates to establish a robust and uniform methodology for inline SEM cross-section analysis.

This project offers hands‑on experience with advanced semiconductor metrology tools and provides an opportunity to contribute directly to the optimization of inspection methods used in a state‑of‑the‑art semiconductor fabrication environment.

Type of internship: Bachelor internship

Required educational background: Bioscience Engineering, Chemistry/Chemical Engineering, Materials Engineering

Supervising scientist(s): For further information or for application, please contact Felix Seidel ( [e-mail] )

The reference code for this position is 2026-INT-269.

imec's cleanroom