Fast and Large Scale Micro-/Nano-lithography for Optical Devices

Imec; Vlaams-Brabant; On-site; EUR 6,700 - 11,000; Full time

Job summary

Imec in Belgium seeks a Master internship to develop a high-speed nano-patterning workflow for metasurface and optical devices. You will explore lithography concepts, nanofabrication, and computational pattern generation, under supervision.

The project combines materials characterization, metrology, and machine-learning approaches for pattern optimization, with opportunities to contribute to publications and presentations.

Qualifications

• Master internship position in a related field.
• Self-supporting students only.
• Educational background includes Chemistry/Chemical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, or Physics.

Responsibilities

• Nano-pattern generation and computational design.
• Experimental fabrication and process optimization.
• Preparation of documentation and support for presentations and publications.

Skills

Nano-patterning

Computational design

Nanofabrication

Documentation

Education

Chemistry/Chemical Engineering

Materials Engineering

Mechanical Engineering

Nanoscience & Nanotechnology

Physics

Job description

/ Fast and Large Scale Micro-/Nano-lithography for Optical Devices

Fast and Large Scale Micro-/Nano-lithography for Optical Devices

Explore the state-of-the-art optical and imaging technologies in semiconductor and bioscience applications

Optical Devices such asdiffractive optical elementsand nanophotonic devices require precise fabrication of subwavelengthstructures with high spatial resolution and patterning efficiency. High-speedoptical nano-patterning offers a promising approach for rapidly fabricatingcomplex structures while maintaining precise control over the generatedpatterns.

This project aims to investigate and develop a high-speedoptical nano-patterning approach for the fabrication of advanced opticaldevices. The project will combine various idea on lithographic system with combinationof material characterization metrology and computational methods.

Goal

Development of a high-speed nano-patterning approach formetasurface and optical device fabrication.

Objectives

• Develop and configure an optical nano-patterningsystem.
• Design and generate nanoscale patterns formetasurfaces and optical devices.
• Characterize the fabricated structures using opticaland imaging techniques.
• Investigate the relationship between patterningparameters and device performance.
• Explore computational and machine-learning approachesfor pattern optimization.

Responsibilitiesmay include (to be confirmed):

• Nano-pattern generation and computational design
• Experimental fabrication and process optimization
• Preparation of documentation and support forpresentations and publications

Expected Outcomes

The internship is expected to demonstrate a high-speednano-patterning workflow and evaluate its potential for metasurface and opticaldevice fabrication. The project will provide practical experience in opticalsystem development, nanofabrication, computational pattern generation, andexperimental characterization.

Type of internship: Master internship

Duration: 6-12

Required educational background: Chemistry/Chemical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics

Supervising scientist(s): For further information or for application, please contact Hyun-su Kim ( [e-mail] )

The reference code for this position is 2026-INT-355. Mention this reference code in your application.

Only for self-supporting students.

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