EUV Lithography & Materials Intern: Hands-on Research & DOE

Micron Technology

Boise (ID)

On-site

USD 28,000 - 41,000

Full time

14 days+
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Job summary

Micron Technology invites applications for an EUV Lithography & Materials Intern based in Boise, Idaho. You will contribute to photolithography process development, materials optimization, and patterning performance improvements while collaborating with Photolithography, Metrology, Dry Etch, Wet Process teams.

The role involves DOE-based experiments, data analysis, and communicating results. Opportunity to apply AI/data-driven methods to advance semiconductor manufacturing technologies.

Qualifications

  • Currently pursuing a B.S., M.S., or Ph.D. in Engineering, Chemistry, Materials Science, Photolithography, or related field.
  • Must be returning to academic studies through Fall 2027.
  • Demonstrated analytical and problem-solving skills through coursework, research, lab work, or projects.
  • Ability to work independently, manage tasks, and meet timelines.
  • Strong written, verbal, and presentation communication skills.

Responsibilities

  • Design and implement experiments using DOE to optimize photolithography processes, including EUV lithography and photoresist development.
  • Plan, coordinate, and perform experiments in cleanroom environments, including remote fabrication collaboration when needed.
  • Analyze and interpret process data and imaging results using in-house and commercial tools.
  • Communicate project plans, progress and conclusions in reports and presentations.
  • Apply AI and data-driven methods to support research, process optimization, and reporting.

Skills

Analytical skills
Independent work
Communication skills

Education

B.S./M.S./Ph.D. in Engineering, Chemistry, Materials Science, Photolithography, or related field

Job description

Micron Technology invites applications for an EUV Lithography & Materials Intern based in Boise, Idaho. You will contribute to photolithography process development, materials optimization, and patterning performance improvements while collaborating with Photolithography, Metrology, Dry Etch, Wet Process teams.

The role involves DOE-based experiments, data analysis, and communicating results. Opportunity to apply AI/data-driven methods to advance semiconductor manufacturing technologies.

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