EUV Lithography & Materials Intern – Photolithography R&D

1000 Micron Technology, Inc.; Boise (ID); Vor Ort; USD 20.000 - 30.000; Vollzeit

Benefits dieser Stelle

Medical, dental and vision plans

Paid time off

Paid holidays

Paid family leave

Zusammenfassung

Micron Technology, Inc. in Boise, Idaho, is seeking an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will design experiments using DOE, plan cleanroom work, analyze data with CD-SEM and LWR, and communicate findings through reports and presentations. Collaborating with Photolithography, Metrology, Dry Etch, Wet Process, and related teams, you will apply AI and data-driven methods to

Qualifikationen

• Currently pursuing a B.S., M.S., or Ph.D. degree in Engineering, Chemistry, Materials Science, Photolithography, or a related technical field.
• Must be returning to academic studies following the internship and continuing education through at least Fall 2027.
• Demonstrated analytical and problem-solving skills through coursework, research, laboratory experience, or industry projects.
• Ability to work independently, manage project tasks, and meet established timelines.
• Strong written, verbal, and presentation communication skills.

Aufgaben

• Design and implement experiments using Design of Experiments (DOE) methodologies to optimize photolithography processes, including EUV lithography, photoresist development, and related patterning applications.
• Plan, coordinate, and perform experiments in semiconductor cleanroom environments, including collaboration with remote fabrication facilities when required.
• Analyze and interpret process data and imaging results using in-house and commercial software tools, including CD-SEM measurements, line width roughness (LWR), registration, and cross-sectional analysis.
• Communicate project plans, progress, conclusions, and recommendations through technical reports and presentations.
• Apply Artificial Intelligence (AI) and data-driven methodologies, where appropriate, to support research, process optimization, data analysis, and reporting activities.

Kenntnisse

Analytical skills

Data analysis

Communication skills

Independent work

Ausbildung

B.S./M.S./Ph.D. in Engineering or related field

Tools

CD-SEM

DOE methods

Jobbeschreibung

Micron Technology, Inc. in Boise, Idaho, is seeking an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will design experiments using DOE, plan cleanroom work, analyze data with CD-SEM and LWR, and communicate findings through reports and presentations. Collaborating with Photolithography, Metrology, Dry Etch, Wet Process, and related teams, you will apply AI and data-driven methods to