EUV Lithography Intern: Materials & Process Innovation

Micron Technology, Inc; Boise (ID); On-site; USD 28,000 - 33,000; Full time

Benefits offered by this job

Medical, dental and vision plans

Paid time off

Paid holidays

Equal opportunity workplace

Job summary

Micron Technology, Inc. in Boise, Idaho, seeks an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will collaborate with Photolithography, Metrology, Dry Etch, Wet Process, and related teams to advance semiconductor technologies during multiple project assignments. The role emphasizes hands-on DOE experiments, data analysis, and AI-assisted research, with ongoing opportunities to

Qualifications

• Pursuing a B.S., M.S., or Ph.D. in Engineering, Chemistry, Materials Science, Photolithography, or a related technical field.
• Must be returning to academic studies following the internship and continuing education through at least Fall 2027.
• Demonstrated analytical and problem-solving skills through coursework, research, laboratory experience, or industry projects.
• Ability to work independently, manage project tasks, and meet established timelines.
• Strong written, verbal, and presentation communication skills.

Responsibilities

• Design and implement experiments using Design of Experiments (DOE) methodologies to optimize photolithography processes, including EUV lithography, photoresist development, and related patterning applications.
• Plan, coordinate, and perform experiments in semiconductor cleanroom environments, including collaboration with remote fabrication facilities when required.
• Analyze and interpret process data and imaging results using in-house and commercial software tools, including CD-SEM measurements, line width roughness (LWR), registration, and cross-sectional analysis.
• Communicate project plans, progress, conclusions, and recommendations through technical reports and presentations.
• Apply Artificial Intelligence (AI) and data-driven methodologies, where appropriate, to support research, process optimization, data analysis, and reporting activities.

Skills

Analytical problem solving

Independent work

Project management

Communication skills

Education

B.S./M.S./Ph.D. in Engineering, Chemistry, Materials Science, Photolithography

Tools

Design of Experiments (DOE)

CD-SEM

AI/data-driven methods

Data analysis tools

Job description

Micron Technology, Inc. in Boise, Idaho, seeks an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will collaborate with Photolithography, Metrology, Dry Etch, Wet Process, and related teams to advance semiconductor technologies during multiple project assignments. The role emphasizes hands-on DOE experiments, data analysis, and AI-assisted research, with ongoing opportunities to