Photolithography Intern: AI-Driven Process Optimization

Micron Technology; Boise (ID); On-site; USD 28,000 - 36,000; Full time

Job summary

Micron Technology in Boise, Idaho, invites a DRAM Lithography Intern to contribute to next-generation semiconductor manufacturing projects. You will collaborate across Photolithography, Metrology, Dry Etch, Wet Process, and other teams to develop process optimization solutions and apply AI/data-driven approaches to manufacturing challenges.

This internship offers hands-on DOE design, in-cleanroom experimentation, data analysis, and presentation of findings.

Qualifications

• Currently pursuing a BS/MS/PhD in Engineering, Chemistry, Physics, or a related field relevant to photolithography.
• Must be enrolled in an academic program and continuing education through Fall 2027.
• Demonstrated analytical and problem-solving skills through coursework, research, or project experience.
• Ability to work independently, manage project timelines, and deliver results in a collaborative team environment.
• Strong written, verbal, and presentation communication skills.

Responsibilities

• Design and execute experiments (DOE) to optimize photolithography processes, including EUV lithography, photoresist performance, and related process technologies.
• Plan, run, and document experiments in a semiconductor cleanroom environment using advanced process equipment.
• Analyze process images and manufacturing data using commercial and in-house software tools, including AI-enabled methodologies where appropriate.
• Support projects focused on photolithography simulations, process window optimization, overlay improvement, and CDU performance.
• Communicate project plans, technical findings, and recommendations through written reports and presentations.

Skills

Analytical thinking

Problem solving

Communication

AI/data analysis

Team collaboration

Education

BS/MS/PhD in Engineering/Physics

Enrolled through Fall 2027

Job description

Micron Technology in Boise, Idaho, invites a DRAM Lithography Intern to contribute to next-generation semiconductor manufacturing projects. You will collaborate across Photolithography, Metrology, Dry Etch, Wet Process, and other teams to develop process optimization solutions and apply AI/data-driven approaches to manufacturing challenges.

This internship offers hands-on DOE design, in-cleanroom experimentation, data analysis, and presentation of findings.