EUV Lithography & Materials Intern

Micron Technology, Inc.

Boise (ID)

On-site

USD 25,000 - 39,000

Part time

14 days+
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Benefits offered by this job

Medical/Dental/Vision benefits
Paid time off
Paid holidays
tuition assistance?
AI-enabled resume/tools encouragement

Job summary

Micron Technology, Inc. in Boise, Idaho invites an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will collaborate with Photolithography, Metrology, Dry Etch, and Wet Process teams on research initiatives and data-driven reporting. The internship is based in Boise and supports hands-on experiments, data analysis, and cross-functional communication, with opportunities to apply AI

Qualifications

  • Currently pursuing a degree in Engineering, Chemistry, Materials Science, Photolithography, or related field.
  • Must be returning to academics after internship through at least Fall 2027.
  • Demonstrated analytical and problem-solving abilities through coursework or projects.
  • Able to manage tasks independently and meet timelines.
  • Strong written and verbal communication skills.

Responsibilities

  • Design and execute experiments using DOE to optimize photolithography processes including EUV lithography.
  • Plan and perform experiments in cleanroom environments, collaborating with remote facilities as needed.
  • Analyze process data and imaging results using software tools like CD-SEM; report findings.
  • Communicate project plans, progress, and conclusions via reports and presentations.
  • Apply AI and data-driven methods to support research and process optimization.

Skills

DOE design and optimization
Data analysis
Public speaking/presentation
Independent work
Communication skills

Education

Pursuing B.S./M.S./Ph.D. in Engineering/Materials/Chemistry
Returning to academic studies Fall 2027

Tools

CD-SEM tools
Statistical software
Python/Scientific computing

Job description

Micron Technology, Inc. in Boise, Idaho invites an EUV Lithography & Materials Intern to contribute to photolithography process development, materials optimization, and patterning performance improvements.

You will collaborate with Photolithography, Metrology, Dry Etch, and Wet Process teams on research initiatives and data-driven reporting. The internship is based in Boise and supports hands-on experiments, data analysis, and cross-functional communication, with opportunities to apply AI

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