EUV Lithography Intern: AI-Driven Semiconductor Research

Micron; Boise (ID); Sur place; USD 13 000 - 20 000; Plein temps

Résumé du poste

Micron Technology in Boise, Idaho invites an EUV Lithography Intern to join the team advancing photolithography technologies for next‑generation memory products. You will design experiments, analyze process data, and evaluate lithography performance to drive process improvements.

Collaborate with multidisciplinary engineers, learn DOE methods, and apply AI and AI‑assisted tools to accelerate research, data interpretation, and reporting.

Qualifications

• Currently pursuing a B.S., M.S., or Ph.D. in engineering/related field; continuing through Fall 2027.
• Strong analytical, problem-solving, and communication skills.
• Ability to work independently, coordinate project activities, and meet objectives.

Responsabilités

• Design and execute experiments (DOE) to optimize photolithography processes, including EUV lithography.
• Plan, coordinate, and support semiconductor process experiments in cleanroom environments.
• Analyze images, metrology results, and process data to evaluate critical dimensions and process capability.
• Communicate plans, results, and recommendations through reports and presentations.
• Apply AI and AI-assisted tools to support research and engineering productivity.

Connaissances

Analytical and problem-solving

Independent work

Communication skills

Project coordination

Formation

B.S./M.S./Ph.D. in Engineering/Physics/Chemistry/Materials Science

Outils

Python

MATLAB

JMP

R

AI tools

Description du poste

Micron Technology in Boise, Idaho invites an EUV Lithography Intern to join the team advancing photolithography technologies for next‑generation memory products. You will design experiments, analyze process data, and evaluate lithography performance to drive process improvements.

Collaborate with multidisciplinary engineers, learn DOE methods, and apply AI and AI‑assisted tools to accelerate research, data interpretation, and reporting.