EUV Lithography Intern: Photolithography & AI Projects

Micron Technology, Inc; Boise (ID); On-site; USD 28,000 - 41,000; Part time

Job summary

Micron Technology, Inc. is seeking an EUV Lithography Intern to support the advancement of semiconductor manufacturing technologies and next‑generation memory products.

You will collaborate with multi-functional engineering teams to design experiments, analyze data, and develop innovative solutions related to EUV lithography and line width roughness improvements. Minimum qualifications include pursuing a B.S., M.S., or Ph.D.

Qualifications

• Pursuing a STEM degree and continuing education through Fall 2027.
• Strong analytical, problem-solving, and written/spoken communication skills.
• Ability to work independently and meet timelines.
• Experience in photolithography or semiconductor manufacturing is a plus.
• Programming/scripting in Python, MATLAB, JMP, or R is preferred.

Responsibilities

• Design and execute DOE experiments to optimize photolithography processes.
• Plan, coordinate, and support semiconductor process experiments in cleanroom environments.
• Analyze images, metrology results, and process data to evaluate critical dimensions and process capability.
• Communicate technical plans, project status, results, and recommendations through reports and data-driven analyses.
• Apply AI tools to support research, data analysis, process optimization, and productivity.

Skills

Analytical skills

Problem-solving

Written & verbal communication

Presentation skills

Independent work

Team collaboration

Python

MATLAB

JMP

R

Education

Engineering/Physics/Chemistry/Materials Science degree (B.S./M.S./Ph.D.)

Tools

Python

MATLAB

JMP

R

Job description

Micron Technology, Inc. is seeking an EUV Lithography Intern to support the advancement of semiconductor manufacturing technologies and next‑generation memory products.

You will collaborate with multi-functional engineering teams to design experiments, analyze data, and develop innovative solutions related to EUV lithography and line width roughness improvements. Minimum qualifications include pursuing a B.S., M.S., or Ph.D.