EUV Lithography Intern: Photolithography & AI-Driven Research

Micron Technology

Boise (ID)

On-site

USD 28,000 - 39,000

Full time

4 days ago

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Job summary

Micron Technology is seeking an EUV Lithography Intern to advance semiconductor manufacturing technologies and memory product development. You will design experiments, analyze data, and collaborate with multi-functional engineering teams to improve lithography performance and line width roughness, leveraging AI-assisted tools where appropriate.

The role requires pursuing a degree in engineering-related fields, continuing education through Fall 2027, and strong analytical and communication

Qualifications

Currently pursuing a B.S., M.S., or Ph.D. in Engineering, Physics, Chemistry, Materials Science, or a related field relevant to photolithography and semiconductor manufacturing.
Must be continuing education through Fall 2027.
Demonstrated analytical and problem‑solving skills through coursework, research, laboratory work, or technical projects.
Ability to work independently, coordinate project activities, and meet established objectives and timelines.
Strong written, verbal, and presentation communication skills.

Responsibilities

Design and execute experiments (DOE) to optimize photolithography processes, including EUV lithography, photoresist performance, and patterning improvements.
Plan, coordinate, and support semiconductor process experiments in cleanroom environments, including remote manufacturing and development locations.
Analyze images, metrology results, and process data using commercial and internal software tools to evaluate critical dimensions, registration performance, and process capability.
Communicate technical plans, project status, results, and recommendations through written reports, presentations, and data‑driven analyses.
Apply Artificial Intelligence and AI‑Assisted tools, where appropriate, to support research, data analysis, process optimization, reporting, and engineering productivity.