Verification Platform Architect - High-Throughput RTL

Apple Inc.; Austin, Northern (TX, KY); Hybrid; USD 140,000 - 210,000; Full time

Job summary

Apple Inc. seeks a Verification Platform Engineer for Platform Architecture to advance high‑performance RTL simulation tooling and DV workflows.

You will own engagements with silicon engineering, modify testbenches, and improve throughput through infrastructure improvements and platform R&D. Ideal candidates have a BS in EE/CE, strong SystemVerilog and EDA tooling experience, and hands‑on DV methods (UVM, DPI‑C).

Qualifications

• Bachelor's degree in Computer Engineering, Electrical Engineering, or related field.
• SystemVerilog and EDA tooling experience required.
• Software development experience (C++), scripting (Perl or Python).

Responsibilities

• Own engagements with silicon engineering groups to evaluate, integrate, and maintain high performance RTL simulation tooling.
• Modify testbench and design RTL for tool compatibility and simulation efficiency.
• Use internal and external EDA tools to diagnose issues and explore design alternatives.
• Design and integrate infrastructure improvements for faster simulation turnaround after RTL changes.
• Partner with internal teams for focused, high-impact engagements.
• Occasionally travel within the US (about once a year).

Skills

SystemVerilog

C++ programming

Python scripting

DPI-C

UVM

Testbench architecture

Hardware verification

Education

Bachelor's degree in Computer/Electrical Engineering

Master’s degree (preferred)

Tools

RTL simulation tools

LEC

Waveform debugging

EDA tooling

Job description

Apple Inc. seeks a Verification Platform Engineer for Platform Architecture to advance high‑performance RTL simulation tooling and DV workflows.

You will own engagements with silicon engineering, modify testbenches, and improve throughput through infrastructure improvements and platform R&D. Ideal candidates have a BS in EE/CE, strong SystemVerilog and EDA tooling experience, and hands‑on DV methods (UVM, DPI‑C).