Photomask Wet Process Intern: EUV/DUV Tech

Micron Technology; Boise (ID); On-site; USD 28,000 - 41,000; Full time

Benefits offered by this job

Mentorship

High-visibility project

Career networking

Job summary

Micron Technology seeks a Photomask Wet Process Engineering Intern at the Mask Technology Center in Boise. You will contribute to cleaning and resist strip processes for EUV/DUV photomasks and gain hands-on semiconductor process development experience.

You'll lead a summer project with measurable business and technical impact, present findings to engineering teams and site leadership, and collaborate with process, manufacturing, and metrology engineers for data-driven improvements.

Qualifications

• Currently pursuing an MS or PhD in Chemical Engineering, Chemistry, Materials Science, Physics, or a related technical field; graduation after Sept 2027.
• Fundamental knowledge of chemistry, materials science, surface science, or semiconductor manufacturing processes.
• Strong analytical and problem-solving skills.
• Excellent written and verbal communication skills.
• Demonstrated ability to work independently and in a collaborative team environment.

Responsibilities

• Gain hands-on experience developing advanced processes for groundbreaking EUV and DUV photomask technologies.
• Support development and optimization of advanced photomask wet cleaning and resist strip processes.
• Design and implement experiments to evaluate process performance and identify opportunities for improvement.
• Analyze defect, contamination, and yield data using statistical and analytical tools; apply data analytics to identify trends and drive improvements.
• Characterize process equipment and evaluate tool-to-tool matching performance.
• Collaborate with process, manufacturing, equipment, and metrology engineers to investigate excursions and implement corrective actions.
• Develop process characterizations, qualification plans, and technical documentation.
• Apply data science and machine learning techniques to identify correlations and yield improvement opportunities.

Skills

Strong analytical skills

Excellent communication

Independent and collaborative work

Education

MS or PhD in a related field

Tools

Excel

JMP

Python

Tableau

Power BI

Job description

Micron Technology seeks a Photomask Wet Process Engineering Intern at the Mask Technology Center in Boise. You will contribute to cleaning and resist strip processes for EUV/DUV photomasks and gain hands-on semiconductor process development experience.

You'll lead a summer project with measurable business and technical impact, present findings to engineering teams and site leadership, and collaborate with process, manufacturing, and metrology engineers for data-driven improvements.