Intern: Photomask Wet Process Engineer (EUV/DUV)

Micron

Boise (ID)

On-site

USD 30,000 - 41,000

Full time

14 days+

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Benefits offered by this job

Medical plan

Dental plan

Vision plan

Paid time off

Job summary

Micron Technology's Mask Technology Center in Boise is seeking a Photomask Wet Process Engineering Intern to contribute to the development of cleaning and resist strip processes for DUV and EUV photomasks. This role provides hands-on experience in semiconductor process development and data-driven engineering.

You will have the opportunity to lead an independent summer project, present findings to engineering teams and site leadership, and gain exposure to defect reduction, contamination control,

Qualifications

Pursuing MS or PhD in a technical field and not graduating before September 2027.
Strong analytical and problem-solving abilities.
Excellent written and verbal communication.

Responsibilities

Gain hands-on experience developing advanced wet cleaning and resist strip processes for EUV/DUV photomasks.
Lead a high-visibility summer project and present results to MTC leadership.
Analyze defect, contamination, and yield data using statistical methods.
Apply data analytics and AI-assisted tools to identify process improvements.

Skills

Analytical thinking

Problem-solving

Communication skills

Independent work

Team collaboration

Education

MS/PhD candidate in Chemical Engineering, Chemistry, Materials Science, or Physics (not graduating before Sept 2027)

Tools

Excel

Python

Tableau/Power BI

DOE concepts

Job description

You will have the opportunity to lead an independent summer project, present findings to engineering teams and site leadership, and gain exposure to defect reduction, contamination control,

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