Photomask Inspection Process Engineer (EUV)

Micron Technology, Inc

Boise (ID)

On-site

USD 90,000 - 130,000

Full time

14 days+

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Benefits offered by this job

Health insurance

Job summary

Micron Technology, Inc., based in Boise, ID, is seeking a Process Engineer for Photomask Inspection. You will start up, develop, optimize, and sustain reticle inspection processes, including EUV inspection and ADC, to ensure defect‑free printing and high quality.

Collaborate with R&D, FEOL, HVM, and sustaining teams to drive data‑driven decisions and improvements. You will mentor manufacturing personnel, apply AI tools to enhance efficiency, and lead continuous yield, cost, and productivity

Qualifications

Experience in reticle pattern inspection or wafer inspection (RDA).
Experience optimizing inspection sensitivities for defect detection.
Experience developing, tuning, and optimizing ADC systems and algorithms.

Responsibilities

Start up, develop, optimize, and sustain photomask inspection processes including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning.
Identify, diagnose, and resolve process-related manufacturing issues using structured problem-solving methods.
Lead and participate in yield, cost, and productivity improvements and automation initiatives.
Monitor tool health and inspection results; respond to trends and out-of-spec conditions.
Collaborate with R&D, FEOL, HVM, sustaining engineering and defect analysis teams; mentor staff.