OSHA & Workplace Safety Associate - Litigation & Compliance

BCG Attorney Search; Madison (WI); On-site; USD 110,000 - 170,000; Full time

Benefits offered by this job

Eligible for annual bonuses.

Job summary

BCG Attorney Search seeks an OSHA Associate in Madison, WI to guide clients on workplace safety compliance with OSHA regulations and to manage related labor and employment matters. The role involves handling litigation related to safety and discrimination, negotiating on behalf of clients, and coordinating with outside counsel and regulatory bodies.

The candidate should have a J.D. from an ABA-accredited law school, with 3+ years of employment litigation experience including OSHA exposure, and

Qualifications

• J.D. from an ABA-accredited law school with exceptional academic credentials.
• 3+ years of employment litigation experience; OSHA experience required.
• Admitted to State Bar of the Associate's primary office.

Responsibilities

• Support and guide business partners on environmental and workplace safety compliance.
• Manage outside counsel and vendors on global EH&S issues.
• Develop relationships with regulatory agencies and influence policy development.
• Handle litigation related to workplace safety and discrimination matters.
• Represent clients in negotiations and mediations.
• Provide crisis management for workplace safety and health issues.

Skills

Attention to detail

Time management

Strong written and oral communication

Team collaboration

Education

Juris Doctor (J.D.)

Admitted to State Bar

Job description

BCG Attorney Search seeks an OSHA Associate in Madison, WI to guide clients on workplace safety compliance with OSHA regulations and to manage related labor and employment matters. The role involves handling litigation related to safety and discrimination, negotiating on behalf of clients, and coordinating with outside counsel and regulatory bodies.

The candidate should have a J.D. from an ABA-accredited law school, with 3+ years of employment litigation experience including OSHA exposure, and