AI‑Driven EUV Mask R&D Engineer

Micron Technology, Inc.

Boise (ID)

On-site

USD 110,000 - 160,000

Full time

14 days+
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Benefits offered by this job

Medical/dental/vision
Paid time off
Paid holidays
401(k) benefits

Job summary

Micron Technology is seeking an experienced materials science/semiconductor R&D professional to join the Mask Technology Center in Boise, Idaho. You will develop AI‑assisted EUV mask materials and processes, driving High‑NA readiness and translating lithography requirements into manufacturable mask solutions.

Collaborate with OPC, design, and lithography teams, perform data‑driven R&D using DOE, and contribute to technology roadmaps.

Qualifications

  • MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field.
  • 2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.
  • Direct experience in semiconductor mask, lithography, or wafer fabrication environments (EUV, DUV, or advanced nodes) preferred.
  • Experience with actinic mask inspection, defect printability analysis, or mask repair advantageous.

Responsibilities

  • Develop AI assisted EUV mask blank materials and processes, including film stack design, deposition, etch, clean, and patterning quality.
  • Advance High‑NA EUV readiness through material selection, mask design, stitching, lithography performance optimization, and lifetime improvement.
  • Translate lithography requirements into manufacturable mask solutions in collaboration with OPC, design, and lithography teams.
  • Conduct data‑driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability.
  • Collaborate with cross‑functional engineering teams to transition new technologies into FEOL process engineering.

Skills

Semiconductor manufacturing
DOE data analysis
Cross-functional collaboration

Education

MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or related field

Tools

EUV mask/wafer tech
Mask design

Job description

Micron Technology is seeking an experienced materials science/semiconductor R&D professional to join the Mask Technology Center in Boise, Idaho. You will develop AI‑assisted EUV mask materials and processes, driving High‑NA readiness and translating lithography requirements into manufacturable mask solutions.

Collaborate with OPC, design, and lithography teams, perform data‑driven R&D using DOE, and contribute to technology roadmaps.

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