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Micron Technology, Inc in Boise, Idaho is seeking an EUV Mask Technology FEOL RND Engineer. You will develop AI-assisted EUV mask blank materials and processes, optimize lithography performance for High-NA EUV, and translate lithography requirements into manufacturable mask solutions with cross-functional OPC and design teams.
The role involves data-driven R&D to improve yield, reliability, and manufacturability, collaborating with cross-functional teams to transition new technologies into FEOL
Micron Technology, Inc in Boise, Idaho is seeking an EUV Mask Technology FEOL RND Engineer. You will develop AI-assisted EUV mask blank materials and processes, optimize lithography performance for High-NA EUV, and translate lithography requirements into manufacturable mask solutions with cross-functional OPC and design teams.
The role involves data-driven R&D to improve yield, reliability, and manufacturability, collaborating with cross-functional teams to transition new technologies into FEOL