EUV Mask Technology RND Engineer

Micron Technology; Boise (ID); On-site; USD 120,000 - 160,000; Full time

Benefits offered by this job

Medical benefits

Paid time off

Holidays

Job summary

Micron Technology seeks a highly skilled scientist/engineer to develop AI-assisted EUV mask blank materials and processes at our Mask Technology Center. You will design film stacks, deposition, etch, clean, and patterning quality, advancing High-NA EUV readiness and collaborating with OPC, design, and lithography teams to deliver manufacturable mask solutions.

You will perform data-driven R&D using DOE to improve yield, reliability, and manufacturability, and work with cross-functional teams to

Qualifications

• MS or PhD in a relevant field with research or industry experience in semiconductor technologies.
• Experience in semiconductor manufacturing or related process development is preferred.

Responsibilities

• Develop AI-assisted EUV mask blank materials and processes including film stack design and patterning quality.
• Advance High-NA EUV readiness through material selection, mask design, and lithography performance optimization.
• Translate lithography requirements into manufacturable mask solutions in collaboration with OPC and design teams.
• Conduct data-driven R&D using DOE and analysis to improve yield, reliability, and manufacturability.
• Collaborate with cross-functional engineering teams to transition new technologies into FEOL process engineering.

Education

MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or related field

Job description

Overview

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. At Micron’s Mask Technology Center (MTC), we develop the materials, films, and processes that enable next‑generation AI assisted EUV lithography. Our team collaborates across materials science, lithography, OPC, and high‑volume manufacturing to solve critical challenges in advanced DRAM scaling. We are a hands‑on, innovative group driving technologies that shape the future of High‑NA EUV.

Responsibilities

• Develop AI assisted EUV mask blank materials and processes, including film stack design, deposition, etch, clean, and patterning quality
• Advance High‑NA EUV readiness through material selection, mask design, stitching, lithography performance optimization, and lifetime improvement
• Translate lithography requirements into manufacturable mask solutions in collaboration with OPC, design, and lithography teams
• Conduct data‑driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability
• Collaborate with cross‑functional engineering teams to transition new technologies into FEOL process engineering

Minimum Qualifications

• MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field
• 2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies

Preferred Qualifications

• Direct experience in semiconductor mask, lithography, or wafer fabrication environments (EUV, DUV, or advanced nodes)
• Experience with actinic mask inspection, defect printability analysis, or mask repair
• Strong background in BEOL or FEOL process control, mask process qualification, or high-volume semiconductor manufacturing
• Experience defining tool requirements, specifications, and roadmap strategy for semiconductor material, equipment, or processes
• Proven track record working with semiconductor equipment suppliers and engaging in early‑stage tool or process development
• Hands‑on experience with EUV or High‑NA EUV mask/wafer technology development
• Deep understanding of lithography fundamentals, including EUV systems, mask‑to‑wafer correlation, and pattern transfer fidelity
• Experience with lithography simulation, OPC, or mask pattern design for advanced nodes

Benefits

Micron offers a choice of medical, dental and vision plans in all locations, allowing employees to select the plans that best meet their family healthcare needs and budget. Additional benefit programs help protect income if unable to work due to illness or injury, and paid family leave. Micron also provides a robust paid time‑off program and paid holidays. For additional information regarding the Benefit programs available, please see the Benefits Guide posted on micron.com/careers/benefits.

Equal Opportunity Employer

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.