EUV Mask Technology RND Engineer

1000 Micron Technology, Inc.; Boise (ID); On-site; USD 110,000 - 150,000; Full time

Benefits offered by this job

Medical insurance

Dental insurance

Vision insurance

Paid time off

Paid holidays

Job summary

Micron Technology, at the Mask Technology Center, seeks a seasoned researcher to advance AI-assisted EUV mask materials and processes. You will work with cross‑functional teams to design film stacks, deposition, etching, and patterning quality, contributing to High‑NA EUV readiness and robust manufacturable mask solutions.

The role requires an MS/PhD in a relevant field and 2+ years in semiconductor manufacturing or related research, with preference for experience in EUV/advanced nodes and mask

Qualifications

• MS/PhD in a relevant field required.
• 2+ years of experience in semiconductor manufacturing or R&D.
• Experience with lithography, EUV, or mask materials preferred.

Responsibilities

• Develop AI-assisted EUV mask blank materials and processes, including film stack design, deposition, etch, clean, and patterning quality.
• Advance High‑NA EUV readiness through material selection, mask design, stitching, lithography performance optimization, and lifetime improvement.
• Translate lithography requirements into manufacturable mask solutions in collaboration with OPC, design, and lithography teams.
• Conduct data‑driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability.
• Collaborate with cross‑functional engineering teams to transition new technologies into FEOL process engineering.

Skills

Semiconductor manufacturing experience

DOE analysis

Education

MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or related field

Job description

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. At Micron’s Mask Technology Center (MTC), we develop the materials, films, and processes that enable next‑generation AI assisted EUV lithography. Our team collaborates across materials science, lithography, OPC, and high‑volume manufacturing to solve critical challenges in advanced DRAM scaling. We are a hands‑on, innovative group driving technologies that shape the future of High‑NA EUV. In this role, you will join an R&D team focused on next‑generation EUV mask materials and processes, helping drive readiness for High‑NA EUV manufacturing. You will contribute to technology roadmap development, partner with world‑class engineering teams and suppliers, and translate complex lithography requirements into robust, manufacturable mask solutions.

Responsibilities

• Develop AI-assisted EUV mask blank materials and processes, including film stack design, deposition, etch, clean, and patterning quality.
• Advance High‑NA EUV readiness through material selection, mask design, stitching, lithography performance optimization, and lifetime improvement.
• Translate lithography requirements into manufacturable mask solutions in collaboration with OPC, design, and lithography teams.
• Conduct data‑driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability.
• Collaborate with cross‑functional engineering teams to transition new technologies into FEOL process engineering.

Minimum Qualifications

• MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field.
• 2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.

Preferred Qualifications

• Direct experience in semiconductor mask, lithography, or wafer fabrication environments (EUV, DUV, or advanced nodes).
• Experience with actinic mask inspection, defect printability analysis, or mask repair.
• Strong background in BEOL or FEOL process control, mask process qualification, or high‑volume semiconductor manufacturing.
• Experience defining tool requirements, specifications, and roadmap strategy for semiconductor material, equipment, or processes.
• Proven track record working with semiconductor equipment suppliers and engaging in early‑stage tool or process development.
• Hands‑on experience with EUV or High‑NA EUV mask/wafer technology development.
• Deep understanding of lithography fundamentals, including EUV systems, mask‑to‑wafer correlation, and pattern transfer fidelity.
• Experience with lithography simulation, OPC, or mask pattern design for advanced nodes.

Benefits

Micron benefits are designed to help you stay well, provide peace of mind, and help you prepare for the future. We offer a choice of medical, dental, and vision plans in all locations, enabling team members to select the plans that best meet their family healthcare needs and budget. Micron also provides benefit programs that help protect your income if you are unable to work due to illness or injury, and paid family leave. Additionally, Micron benefits include a robust paid time‑off program and paid holidays. For additional information regarding the benefit programs available, please see the Benefits Guide posted on micron.com/careers/benefits.

Equal Opportunity and EEO Statement

Micron is proud to be an equal‑opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity, or any other factor protected by applicable federal, state, or local laws.