Principal Dry Etch Engineer—NAND Innovation Leader

Micron

Singapore

On-site

SGD 150,000 - 230,000

Full time

3 days ago
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Job summary

Micron Technology, Inc. seeks a Principal Engineer/MTS to join the Next Gen NAND Dry Etch team. You will manage dry etch chambers, drive process roadmaps, mentor engineers, and collaborate with process integration, Wet Etch, CVD, and other groups to meet program and yield targets.

You will lead innovation in dry etch, mentor junior staff, and present technology roadmaps while integrating AI-assisted improvements. A strong background in plasma etch and SPC is essential.

Qualifications

  • PhD with ≥5 years in chemical, mechanical, electrical, or semiconductor engineering and dry etch experience.
  • ≥5 years NAND/DRAM/Logic module development with cross-functional teams.
  • Strong leadership and project management experience.
  • Knowledge of plasma physics, chemistry, and reactor types.
  • Expertise in statistical analysis and problem solving.

Responsibilities

  • Lead innovation in dry etch technology and module advancement.
  • Develop and optimize dry etch processes to meet specs.
  • Define equipment roadmap with hardware teams for current/upcoming NAND generations.
  • Mentor engineers and lead cross-functional problem solving.
  • Present process/technology roadmaps to upper management.
  • Guide AI-enabled improvements and cross-functional task forces.

Skills

Dry etch process development
NAND/DRAM/Logic module development
Statistical process control
Python / data science basics
Leadership / mentoring

Education

PhD in relevant field
Master's degree in relevant field

Tools

MS Office
SAS/JMP

Job description

Micron Technology, Inc. seeks a Principal Engineer/MTS to join the Next Gen NAND Dry Etch team. You will manage dry etch chambers, drive process roadmaps, mentor engineers, and collaborate with process integration, Wet Etch, CVD, and other groups to meet program and yield targets.

You will lead innovation in dry etch, mentor junior staff, and present technology roadmaps while integrating AI-assisted improvements. A strong background in plasma etch and SPC is essential.

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