EUV Contamination Control Expert (f/m/x)

Carl Zeiss SMT GmbH; Oberkochen; On-site; EUR 90,000 - 120,000; Full time

Job summary

Carl Zeiss SMT GmbH in Germany seeks a specialist to lead contamination prevention for EUV lithography and mask inspection systems. You will define cleanliness specs for products and processes, develop contamination metrology, and coordinate tests on EUV and plasma interactions.

The role requires a Master’s degree in Chemistry, Physics or Engineering, deep vacuum technology knowledge, and proven project management with fluent English.

Qualifications

• Master's degree in Chemistry, Physics or Engineering with strong chemistry knowledge.
• Experience in managing development projects and leading teams.
• Fluent English and ability to coordinate interdisciplinary teams.

Responsibilities

• Be responsible for requirements management regarding contamination prevention for EUV lithography and mask inspection systems.
• Define specifications for products, supplier parts and process chains regarding cleanliness criteria.
• Develop new contamination metrology and support development partners and suppliers.
• Coordinate lifetime tests as well as surface and layer analysis to investigate EUV and plasma interactions.
• Assume responsibility for core competencies related to particulate contamination prevention and particle measurement.

Skills

Project management

Team coordination

Interdisciplinary collaboration

Fluent English

Education

Master's degree in Chemistry/Physics/Engineering

Tools

Vacuum/Ultra-high vacuum tech

Job description

Enabler for smaller, more powerful, and energy-efficient microchips Working for tomorrow today. Around 80 percent of all microchips worldwide are produced using ZEISS technologies. As the centerpiece of every electronically controlled system, they have become an integral part of our everyday lives – whether in smartphones, smart homes or smart factories. ZEISS is a technology leader in the field of semiconductor manufacturing equipment. With high-precision lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, increasingly powerful, and more energy-efficient microchips, and thus plays a pivotal role in the age of micro- and nanoelectronics.

Your Role

• Be responsible for requirements management regarding contamination prevention for new EUV lithography and mask inspection systems
• Defining specifications for products, supplier parts and process chains regarding cleanliness criteria, as well as checking initial samples and carrying out tolerancing on series parts
• Develop new contamination metrology and support development partners and suppliers
• Coordinate lifetime tests as well as surface and layer analysis to investigate EUV and plasma interactions
• Assume responsibility for core competencies related to particulate contamination prevention, particle measurement technology and particle formation

Your Profile

• Master's degree / Diploma in Chemistry or Diploma in Physics / Diploma in Engineering with very good knowledge of chemistry; doctorate or professional experience is an advantage
• Experience in managing development projects
• Knowledge of vacuum and ultra-high vacuum technology, as well as knowledge of lithography and mask inspection systems and their application, is advantageous
• Excellent expertise in the fields of surface chemistry and physics
• Ability to coordinate and motivate interdisciplinary teams, as well as a high level of commitment and drive to perform
• Fluent English skills

Your ZEISS Recruiting Team: Matthias Sonnentag Step out of your comfort zone, excel and redefine the limits of what is possible. That’s just what our employees are doing every single day – in order to set the pace through our innovations and enable outstanding achievements. After all, behind every successful company are many great fascinating people.

In a spacious modern setting full of opportunities for further development, ZEISS employees work in a place where expert knowledge and team spirit reign supreme. All of this is supported by a special ownership structure and the long-term goal of the Carl Zeiss Foundation: to bring science and society into the future together. Join us today. Inspire people tomorrow.

Diversity is a part of ZEISS. We look forward to receiving your application regardless of gender, nationality, ethnic and social origin, religion, philosophy of life, disability, age, sexual orientation or identity.