EUV Contamination Control Expert (f/m/x)

ZEISS Group; Oberkochen; On-site; EUR 70,000 - 110,000; Full time

Job summary

ZEISS Group in Germany seeks a specialist to oversee contamination prevention for EUV lithography and mask inspection systems. You will define cleanliness criteria for products and supplier parts, review samples, and perform tolerancing on series parts.

You will develop new contamination metrology and support partners and suppliers, coordinating lifetime tests and surface analyses to study EUV/plasma interactions, taking responsibility for core particulate contamination competencies.

Qualifications

• Master’s degree or Diploma in Chemistry/Physics/Engineering with strong chemistry knowledge
• Experience managing development projects
• Knowledge of vacuum and ultra-high vacuum technology advantageous
• Expertise in surface chemistry and physics
• Ability to coordinate interdisciplinary teams and drive performance
• Fluent English skills

Responsibilities

• Be responsible for requirements management regarding contamination prevention for EUV lithography and mask inspection systems
• Define specifications for products, supplier parts and process chains regarding cleanliness criteria
• Develop new contamination metrology and support development partners and suppliers
• Coordinate lifetime tests and surface/layer analyses to investigate EUV and plasma interactions
• Assume responsibility for core competencies related to particulate contamination prevention and particle measurement technology

Skills

Project management

Surface chemistry

Fluent English

Interdisciplinary coordination

Education

Master’s degree in Chemistry or Physics or Engineering

Job description

Enabler for smaller, more powerful, and energy-efficient microchips

Working for tomorrow today.

Around 80 percent of all microchips worldwide are produced using ZEISS technologies. As the centerpiece of every electronically controlled system, they have become an integral part of our everyday lives – whether in smartphones, smart homes or smart factories. ZEISS is a technology leader in the field of semiconductor manufacturing equipment. With high-precision lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, increasingly powerful, and more energy-efficient microchips, and thus plays a pivotal role in the age of micro- and nanoelectronics.

Your Role

• Be responsible for requirements management regarding contamination prevention for new EUV lithography and mask inspection systems
• Defining specifications for products, supplier parts and process chains regarding cleanliness criteria, as well as checking initial samples and carrying out tolerancing on series parts
• Develop new contamination metrology and support development partners and suppliers
• Coordinate lifetime tests as well as surface and layer analysis to investigate EUV and plasma interactions
• Assume responsibility for core competencies related to particulate contamination prevention, particle measurement technology and particle formation

Your Profile

• Master’s degree / Diploma in Chemistry or Diploma in Physics / Diploma in Engineering with very good knowledge of chemistry; doctorate or professional experience is an advantage
• Experience in managing development projects
• Knowledge of vacuum and ultra-high vacuum technology, as well as knowledge of lithography and mask inspection systems and their application, is advantageous
• Excellent expertise in the fields of surface chemistry and physics
• Ability to coordinate and motivate interdisciplinary teams, as well as a high level of commitment and drive to perform
• Fluent English skills

Your ZEISS Recruiting Team:

Matthias Sonnentag