Pulsed ALE for Spintronic MRAM & Quantum Gates

Imec; Vlaams-Brabant; On-site; EUR 12,000 - 16,000; Full time

Job summary

Imec invites applications for a Master internship (1 year) in the field of Pulsed Atomic Layer Etching for next-generation spintronic memory and quantum devices. The project targets low-damage ALE with strong patterning control on SOT-MRAM and quantum gate stacks.

The role emphasizes patterning accuracy, damage mitigation and advanced material characterization using techniques like ToF-SIMS, XPS, AFM and TEM.

Qualifications

• Master internship position in a relevant scientific field.
• Educational background spans chemistry, chemical engineering, materials science, energy or physics.
• University promoter: Stefan De Gendt (KU Leuven).

Responsibilities

• Investigate and optimize P ALE processes for patterning SOT MRAM and quantum gate stacks.
• Focus on process control, selectivity and damage mitigation.
• Collaborate with supervising scientist(s) and publish findings within the project.

Education

Chemistry/Chemical Engineering

Electrotechnics/Electrical Engineering

Materials Engineering

Energy

Nanoscience & Nanotechnology

Physics

Other

Tools

ToF-SIMS

XPS

AFM

TEM

EDS

Ellipsometry

XRD

Job description

Imec invites applications for a Master internship (1 year) in the field of Pulsed Atomic Layer Etching for next-generation spintronic memory and quantum devices. The project targets low-damage ALE with strong patterning control on SOT-MRAM and quantum gate stacks.

The role emphasizes patterning accuracy, damage mitigation and advanced material characterization using techniques like ToF-SIMS, XPS, AFM and TEM.