Senior SRAM Layout Design Engineer - Equity Eligible

NVIDIA

Santa Clara (CA)

Presencial

USD 124 000 - 195 500

Tempo integral

14 dias+

Uma candidatura completa num minuto

Currículo e carta de apresentação personalizados, prontos a enviar.

Ultrapassa os filtros ATS

Vantagens oferecidas por esta oferta de emprego

Equity options
Comprehensive benefits package

Resumo da oferta

A leading technology company in California is seeking a Senior Layout Mask Design Engineer to work on custom SRAM designs using advanced FinFET technologies. The ideal candidate will have over 8 years of mask design experience and a strong background in Cadence tools. You will lead a team of designers and ensure the robustness of layouts while collaborating with various teams. This role offers a competitive salary range of $124,000 to $195,500, along with equity and benefits.

Qualificações

  • 8+ years of proven experience in mask design with FinFETs or gate-all-around technologies.
  • Knowledge of DRC and LVS checking flows.
  • Experience in custom SRAM mask design is a plus.

Responsabilidades

  • Perform physical layout for custom embedded SRAM structures.
  • Lead and mentor other mask designers.
  • Communicate with P&R teams to determine specifications.

Conhecimentos

Mask design experience with FinFETs
Strong background with Cadence tools
Deep understanding of circuit layout concepts
Good communication skills

Formação académica

Associate's degree or equivalent experience

Ferramentas

Cadence Virtuoso
ICV or Calibre

Descrição da oferta de emprego

A leading technology company in California is seeking a Senior Layout Mask Design Engineer to work on custom SRAM designs using advanced FinFET technologies. The ideal candidate will have over 8 years of mask design experience and a strong background in Cadence tools. You will lead a team of designers and ensure the robustness of layouts while collaborating with various teams. This role offers a competitive salary range of $124,000 to $195,500, along with equity and benefits.
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