Senior Plasma Process Engineer, R&D for Semiconductors

asm; Phoenix (AZ); On-site; USD 120,000 - 190,000; Full time

Job summary

ASM is seeking R&D-oriented engineers to advance plasma-based semiconductor manufacturing equipment. You will conduct research, characterize hardware, design experiments, and analyze process-hardware interactions to improve existing systems and develop new functionalities.

Ideal candidates hold a PhD in Physics or Engineering (or a Master with 3+ years) and have hands-on expertise with low-pressure RF plasma, PECVD/PEALD, and plasma diagnostics, collaborating across process development,

Qualifications

• PhD in Physics or Engineering or a Master with at least 3 years of professional experience.
• Deep knowledge of low-pressure RF plasma systems (ICP/CCP) and plasma chemistry.
• Experience with plasma diagnostics and etch/deposition processes.

Responsibilities

• Develop and improve semiconductor manufacturing equipment for plasma-based chambers.
• Conduct research, feasibility studies, testing, and data-driven evaluation.
• Characterize hardware, define process windows, and analyze interactions.
• Design experiments and report results; contribute to multi-disciplinary teams.
• Advance new equipment capabilities from concept to detailed design.

Skills

Low-pressure RF plasma

Plasma-surface interactions

Process development

Technical documentation

Cross-functional collaboration

Education

PhD in Physics or Engineering or Master with 3+ years

Tools

COMSOL

HFSS

CST Studio

Langmuir probes

OES

VI probes

Job description

ASM is seeking R&D-oriented engineers to advance plasma-based semiconductor manufacturing equipment. You will conduct research, characterize hardware, design experiments, and analyze process-hardware interactions to improve existing systems and develop new functionalities.

Ideal candidates hold a PhD in Physics or Engineering (or a Master with 3+ years) and have hands-on expertise with low-pressure RF plasma, PECVD/PEALD, and plasma diagnostics, collaborating across process development,