PhD Module Engineering Intern: Thin Films & Process Innovation

Intel Corporation; Hillsboro (OR); On-site; USD 121,000 - 122,000; Full time

Benefits offered by this job

Health benefits

Stock bonuses

Retirement plan

Vacation

Job summary

Intel Corporation's Foundry Logic Technology Development (LTD) Metals team in Hillsboro, OR, offers a graduate internship in semiconductor process development and materials characterization for manufacturing modules.

You will design, execute, and analyze experiments, collaborate with fab technicians, and help optimize metrology strategies to improve throughput and reliability in a high-volume environment.

Qualifications

• PhD student in a related field, pursuing advanced research.
• Strong knowledge of semiconductor processing fundamentals (thin films, lithography, etching).
• Hands-on experience with thin film deposition (ALD, CVD, PVD) and characterization tools.

Responsibilities

• Contribute to process development for a module within LTD Metals.
• Design, execute, analyze experiments and present conclusions to the group.
• Collaborate with fab technicians and support experiment execution with clear instructions.
• Assist engineering teams in process flow troubleshooting and metrology optimization.
• Apply statistical analysis and DOE to enhance process reliability and throughput.
• Gain experience in materials and device characterization techniques (ellipsometry, XRF, XPS, XRR, AFM, SEM, TEM).

Skills

Data analysis

Design of experiments

Semiconductor processing fundamentals

Education

PhD student in Chemical Eng., Electrical Eng., Material Science, Physics, Chemistry, Mechanical Eng.

Tools

Ellipsometry

XRF

XPS

XRR

4-point probe

AFM

SEM

TEM

Job description

Intel Corporation's Foundry Logic Technology Development (LTD) Metals team in Hillsboro, OR, offers a graduate internship in semiconductor process development and materials characterization for manufacturing modules.

You will design, execute, and analyze experiments, collaborate with fab technicians, and help optimize metrology strategies to improve throughput and reliability in a high-volume environment.