EUV Lithography Process Engineer – AI-Driven Optimization

Micron Technology, Inc.

Boise (ID)

On-site

USD 120,000 - 180,000

Full time

14 days+

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Benefits offered by this job

Medical, dental, vision plans

Paid time off

Paid holidays

Job summary

Micron Technology, Inc. in Boise, Idaho, is seeking an EUV Photolithography Engineer to lead the development, optimization, and sustainment of EUV processes and scanner performance for advanced DRAM nodes.

You will ensure process stability, improve yield, and drive continuous improvement through data analysis, cross-functional collaboration, and CAPA when needed. Experience with AI-enabled analytics is highly valued.

Qualifications

Bachelor’s degree in a relevant field with 4+ years in semiconductor manufacturing or a Master’s with 2+ years.
Experience in SPC, excursion management, and high-volume manufacturing process control.
Strong understanding of photolithography including CD, overlay, defectivity, and process window control.

Responsibilities

Own EUV lithography processes and scanner fleets, ensuring stable high-volume manufacturing performance.
Lead rapid response to process excursions with containment, root-cause analysis, wafer disposition, and CAPA implementation.
Collaborate with Operations, Equipment Engineering, Integration, and Metrology to align on priorities and optimize cycle time and output.
Drive continuous improvement of process capability, yield, and equipment productivity via statistical methods, DOE, and data-driven decisions.
Leverage AI-enabled solutions to enhance process optimization and engineering productivity.