Senior Lithography & Photomask Engineer: EUV Yield

Intel Corporation

Leixlip

Hybrid

EUR 103,000 - 161,000

Full time

14 days+

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Benefits offered by this job

Hybrid work model

Job summary

Intel Foundry Services in Leixlip, Ireland, seeks an experienced Process Engineer to lead photomask/reticle operations within high-volume lithography. The role emphasizes cross-functional collaboration across Scanner/Litho, Reticle Design, and Yield teams to drive yield and defect reduction.

The ideal candidate has 8+ years in advanced lithography, deep knowledge of EUV/DUV tools, pellicle technology, and strong data analytics with JMP/Python/MATLAB to model yields and process variations.

Qualifications

  • 8+ years hands-on process engineering in lithography and photomask/reticle technologies.
  • In-depth knowledge of mask fabrication, pellicle tech, and mask defect inspection.
  • Proficiency with DUV and EUV tools, track integration and CD metrology.
  • Experience with SPC, DOE, and data modeling tools (JMP, Python, MATLAB).
  • Leadership in cross-functional teams and technical documentation.

Responsibilities

  • Oversee photomask incoming quality control and reticle lifecycle management.
  • Drive pellicle development and optimize reticle usage and inspection strategies.
  • Partner with Scanner/Litho, Reticle Design, Thin Films, Etch, Yield teams to diagnose excursions.
  • Lead RCFA for yield-limiting defects during node development and HVM.
  • Provide technical mentorship and engage with lithography equipment suppliers.

Skills

Leadership
Data analysis
Cross-functional collaboration
Communication
Python

Education

MS/PhD in a related semiconductor field

Tools

JMP
DOE
MATLAB

Job description

Intel Foundry Services in Leixlip, Ireland, seeks an experienced Process Engineer to lead photomask/reticle operations within high-volume lithography. The role emphasizes cross-functional collaboration across Scanner/Litho, Reticle Design, and Yield teams to drive yield and defect reduction.

The ideal candidate has 8+ years in advanced lithography, deep knowledge of EUV/DUV tools, pellicle technology, and strong data analytics with JMP/Python/MATLAB to model yields and process variations.

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