ALD Process and Thin-Film Reasoning Evaluator

ixolabs.ai; France; Hybride; EUR 96 000 - 120 000; Plein temps

Résumé du poste

IXO is seeking practical ALD knowledge that helps distinguish a physically credible process explanation from a fluent but incorrect one. You will examine deposition problems at the level of process choices, surface reactions and the measurements used to assess a film.

Location: Remote; United States residence applies to this track. Planning availability is 10–40 hours a week; IXO confirms the actual scope, duration and schedule before work.

Qualifications

• Hands-on development, optimization or troubleshooting of ALD processes.
• Deep familiarity with deposition for semiconductors or advanced packaging, precursor chemistry and surface reactions.
• Practical characterization using XRD, SEM, TEM, XPS or ellipsometry.
• PhD/Masters or equivalent practical experience in materials science, chemistry, chemical engineering or physics.
• Precise, concise scientific writing in English.

Responsabilités

• Create and solve technical problems in ALD process development, semiconductor processing and thin-film characterization.
• Review scientific outputs for mistakes about precursor behavior, surface-reaction mechanisms and process optimization.
• Rank alternative responses against defined scientific criteria, explaining the reasons for the judgment.
• Organize process settings, recipes and characterization results into clear evaluation records with the context needed for meaningful interpretation.

Connaissances

ALD development

Process optimization

Semiconductor deposition

Troubleshooting ALD

Formation

PhD or MSc in materials science/chemistry/chemical engineering/physics

Outils

XRD

SEM

TEM

XPS

Ellipsometry

Description du poste

IXO is seeking practical ALD knowledge that helps distinguish a physically credible process explanation from a fluent but incorrect one. You will examine deposition problems at the level of process choices, surface reactions and the measurements used to assess a film.

Work you will do

• Create and solve technical problems in ALD process development, semiconductor processing and thin-film characterization.
• Review scientific outputs for mistakes about precursor behavior, surface-reaction mechanisms and process optimization.
• Rank alternative responses against defined scientific criteria, explaining the reasons for the judgment.
• Organize process settings, recipes and characterization results into clear evaluation records with the context needed for meaningful interpretation.

Preferred background

• Hands-on development, optimization or troubleshooting of ALD processes.
• Deep familiarity with deposition for semiconductors or advanced packaging, precursor chemistry and surface reactions.
• Practical characterization using methods such as XRD, SEM, TEM, XPS or ellipsometry.
• PhD/Masters or equivalent practical experience in materials science, chemistry, chemical engineering or physics.
• Precise, concise scientific writing in English.

Original ALD tasks and solutions, rubric-based comparative reviews and organized process/measurement evidence.

Location and schedule

Remote; United States residence applies to this track. Planning availability is 10–40 hours a week; IXO confirms the actual scope, duration and schedule before work.

Pay and working terms

$89/hr USD. IXO will agree the assignment scope, hourly rate, schedule and acceptance criteria before work begins. Work is a paid remote expert engagement; applying does not guarantee an assignment. Use only public, licensed or otherwise authorized material. Do not provide confidential employer information, personal data or restricted research.