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Jefferson Wells Belgium is seeking a highly skilled researcher to develop and optimize patterning processes using EUV and High-NA EUV lithography for memory and logic applications.
The role focuses on designing and executing experiments, delivering lithography processes, and collaborating with multidisciplinary teams to advance semiconductor technologies at a cutting-edge R&D environment.
For our client specialized in the microelectronics R&D, you will be responsible for developing and optimizing patterning processes using EUV and High-NA EUV lithography technologies for memory and logic applications.
We offer a challenging assignment within a leading microelectronics R&D environment, where you will contribute to the development of next-generation semiconductor technologies using advanced EUV and High-NA EUV lithography. You will work on innovative memory and logic applications, collaborate with multidisciplinary experts, and gain exposure to cutting-edge process development in a highly international setting. This role provides a unique opportunity to work at the forefront of semiconductor innovation while interacting with both internal stakeholders and global technology partners.