Intern: AI-Driven OPC/RET Mask Tech

Micron Technology, Inc

Boise (ID)

On-site

USD 28,000 - 41,000

Full time

14 days+

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Job summary

Micron Technology, Inc, in Idaho, invites interns to join the Advanced Mask Development Group to explore Optical Proximity Correction (OPC) and Resolution Enhancement Techniques (RET) through hands-on projects. You will work with experienced RET engineers, develop AI-driven workflows, and contribute to reticle design optimization leveraging scripts and programming to broaden process windows.

The program targets students pursuing BS, MS, or PhD in Engineering or Science, with strong analytical

Qualifications

Pursuing a BS, MS, or PhD in Engineering or Science. Graduation date should not be prior to September 1, 2027
Validated analytical skills
Experience in multi-tasking and driving complex projects
Simulation
Concept of lithography and microfabrication

Responsibilities

Study photolithography modeling theory and simulation methodology.
Build AI work flow and programs for RET/OPC tasks.
Improve beyond the existing metrics achieved by the Process-Of-Record.
Build a document of Best Known Method based from your learning, detailing the thought process and supporting data.
Work on a hands-on and collaborative project with the Photolithography group in Technology Development.
Build automated scripts and/or programs to improve the efficiency of the current methodology.
Identify potential opportunities of improvement, including areas which can be challenging to achieve during the internship period.