SMTS Process Engineer, RET OPC

Micron Technology, Inc; Boise (ID); On-site; USD 100,000 - 130,000; Full time

Benefits offered by this job

Medical, dental, and vision plans

Paid family leave

Robust paid time-off program

Paid holidays

Job summary

Micron Technology, Inc is looking for a highly experienced SMTS Process Engineer to optimize RET and Optical Proximity Correction solutions for advanced memory technologies. The role involves collaboration with various teams to drive innovation and address complex patterning challenges.

Ideal candidates should possess over 12 years of industry experience, a Bachelor's degree in a relevant field, and a wealth of knowledge in lithography fundamentals. Micron offers comprehensive benefits, including various healthcare plans and paid time off.

Qualifications

• 12+ years of experience in semiconductor industry focusing on RET, OPC, lithography or mask development.
• Hands-on experience developing RET/OPC solutions.
• Strong communication skills in technical environments.

Responsibilities

• Drive sophisticated projects in mask development and lithography optimization.
• Develop and implement RET and OPC solutions.
• Mentor junior engineers and share technical knowledge.

Skills

RET/OPC methodologies

EUV lithography fundamentals

Collaboration across engineering disciplines

Problem-solving skills

Mentoring junior engineers

Education

Bachelor’s degree in Electrical Engineering, Materials Science, or related

MS or PhD in Electrical Engineering or Materials Science

Tools

Sentaurus Litho

ProLith

EDA software (Synopsys, Siemens, Cadence)

Programming/scripting languages (Python, Perl, TCL, C, C++)

Job description

Req ID: JR103829 SMTS Process Engineer, RET OPC

Our vision is to transform how the world uses information to enrich life for all.

Position Overview

Micron is seeking a highly experienced Resolution Enhancement Techniques (RET) Engineer to join the AMD team at Micron. At the Senior Member of Technical Staff level, our ideal candidate is a master in their field and has a history of innovation and driving technical direction in the industry. This role will focus on developing and optimizing RET and Optical Proximity Correction (OPC) solutions that enable high-fidelity wafer patterning for advanced memory technologies. This role will partner with a variety of teams to develop innovative reticle solutions, improve tapeout methodologies, and resolve complex patterning challenges across both R&D and HVM environments. We are looking for an ambitious and goals-centric individual to help drive groundbreaking solutions that maintain Micron’s competitive advantage.

Responsibilities

• Drive a steady stream of sophisticated projects with built-in contingency plans related to mask development, lithography optimization, and tapeout flow improvements; sustain performance with multiple critical projects through close collaboration with sister teams.
• Develop, optimize, and implement RET and OPC solutions to improve pattern fidelity, manufacturability, and yield for advanced memory products.
• Investigate and deploy innovative methodologies, software capabilities, and process enhancements to improve lithography performance and operational efficiency.
• Use extensive technical knowledge to guide strategic directions, interpret customer needs, and clearly communicate these needs to internal and external contacts; guide managers and leaders in creating new capabilities and systems.
• Analyze patterning issues across R&D and manufacturing environments, identify root causes, and drive effective corrective actions.
• Drive adoption of AI-enabled engineering best practices to accelerate innovation, automate routine analyses, and enable the organization to focus on solving highly complex technical challenges.
• Mentor junior engineers and nurture the development of technical best practices and knowledge‑sharing within the team.

Minimum Qualifications

• Bachelor’s degree in Electrical Engineering, Materials Science, Physics, Chemical Engineering, or a related technical field with 12+ years of semiconductor industry experience focusing on RET, OPC, lithography, or mask development.
• Hands‑on experience developing and applying RET/OPC methodologies and reticle solutions to improve semiconductor patterning performance.
• Strong understanding of EUV lithography fundamentals/development including optics, diffraction, phase‑shift technologies, resist behavior, and advanced patterning techniques.
• Experience with lithography simulation tools such as Sentaurus Litho, ProLith, or similar platforms.
• Proven track record collaborating effectively across multiple engineering disciplines with strong verbal, written, and presentation skills.
• Demonstrated problem‑solving skills with a background in creating technical solutions in both technology development and manufacturing environments.

Preferred Qualifications

• MS or PhD in Electrical Engineering or Materials Science.
• Experience using EDA software (Synopsys, Siemens, Cadence, Brion, etc.) for OPC modeling, assist feature design, or lithography simulations; familiarity with programming/scripting languages (Python, Perl, TCL, C, or C++).
• Experience mentoring junior engineers and inspiring the career and technical development of others.

Relocation Level: TBD

We offer a choice of medical, dental and vision plans in all locations enabling team members to select the plans that best meet their family healthcare needs and budget. Micron also provides benefit programs that help protect your income if you are unable to work due to illness or injury, and paid family leave. Additionally, Micron benefits include a robust paid time‑off program and paid holidays. For additional information regarding the Benefit programs available, please see the Benefits Guide posted on Benefits | Micron Technology, Inc.

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.