EUV Mask BEOL R&D Engineer

Micron Technology; Boise (ID); On-site; USD 100,000 - 130,000; Full time

Job summary

Micron Technology is seeking an EUV Mask BEOL R&D Engineer to lead the development of EUV mask technologies. This role involves owning high-visibility R&D programs, collaborating with suppliers, and guiding technology choices, while also mentoring others to shape long-term strategies.

The ideal candidate will have an MS or PhD in Physics or related fields with expertise in EUV lithography and experience in driving complex R&D initiatives.

Qualifications

• Master's or Doctorate degree in relevant fields.
• Experience in EUV or High-NA EUV mask or wafer technology.
• Hands-on experience with modeling and mask design.

Responsibilities

• Lead R&D for EUV mask BEOL characterization and quality enablement.
• Develop automated defect classification and printability assessment.
• Drive modeling and lithography simulation to correlate mask properties.

Skills

EUV lithography understanding

R&D leadership

Modeling and simulation

Defect printability knowledge

Education

MS or PhD in Physics, Optics, Materials Science

Tools

Lithography simulation software

Metrology tools

Job description

EUV Mask BEOL R&D Engineer

In this role, you will lead development of EUV mask BEOL technologies that enable Micron’s future roadmap. You’ll own high‑visibility R&D programs, partner closely with suppliers, guide technology choices, and drive readiness for High‑NA EUV manufacturing. This is a hands‑on, high‑impact role for someone who enjoys deep technical exploration, modeling, and mentoring others while shaping long‑term strategy.

Responsibilities

• Lead R&D for EUV mask BEOL characterization, quality enablement, defect printability rules, and imaging performance
• Develop actinic inspection, automated defect classification, printability assessment, metrology, and defect repair processes
• Drive physics‑based modeling and lithography simulation to correlate mask properties with wafer performance
• Define tool capability requirements, lead early supplier engagement, and guide technology selection
• Mentor engineers and transition developed technologies to BEOL process engineering teams

Minimum Qualifications

• MS or PhD in Physics, Optics, Materials Science, or related field
• Experience in EUV or High‑NA EUV mask or wafer technology development
• Strong understanding of EUV lithography and mask‑to‑wafer correlation
• Hands‑on experience with lithography simulation and mask pattern design
• Proven ability to lead sophisticated R&D programs and communicate across teams and suppliers

Preferred Qualifications

• Experience in actinic mask inspection, defect printability, or mask repair
• Background in BEOL mask process quality control or production qualification
• Experience defining advanced semiconductor tool requirements and roadmap strategy
• Familiarity with supplier engagement and early‑phase tool development

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.