Staff Engineer - Thin-Film Deposition & AI-Driven R&D

Micron Technology, Inc.

Singapore

On-site

SGD 90,000 - 150,000

Full time

8 days ago

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Job summary

Micron Technology, Inc. is seeking a PhD/Master’s/Bachelor- level candidate to advance thin film deposition and characterization for CVD processes in Singapore. You will design experiments, analyze data, and communicate results to multi-functional teams while ensuring robust transfer to pilot lines and sustaining process maturity.

AI-assisted techniques will be applied to improve efficiency and outcomes. The role requires strong fundamentals in deposition, film analysis, and process-chemistry

Qualifications

  • Fundamentals of thin film deposition and characterization.
  • DOE/SPC basics; ability to analyze experimental data and draw conclusions.
  • Understanding of plasma/vacuum systems and process-chemistry relationships.

Responsibilities

  • Develop, optimize, and characterize thin film processes (CVD) to meet performance, reliability, and manufacturability targets.
  • Design and execute experiments, analyze data, and communicate results in technical forums.
  • Perform film characterization using SEM, TEM, XPS, SIMS, AFM and correlate results to process outcomes.
  • Support process transfer and pilot line execution; sustain process maturity/capability.
  • Collaborate with multi-functional partners to ensure robust processes meeting electrical/physical requirements.
  • Maintain documentation; produce technical reports and summaries.
  • Integrate AI-assisted tools to improve efficiency, quality, or effectiveness.

Job description

Micron Technology, Inc. is seeking a PhD/Master’s/Bachelor- level candidate to advance thin film deposition and characterization for CVD processes in Singapore. You will design experiments, analyze data, and communicate results to multi-functional teams while ensuring robust transfer to pilot lines and sustaining process maturity.

AI-assisted techniques will be applied to improve efficiency and outcomes. The role requires strong fundamentals in deposition, film analysis, and process-chemistry

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