Senior Principal Photo Metrology Engineer - Overlay/HVM
Micron Technology, Inc.
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Descrizione del lavoro
Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, productivity, and cost initiatives across fabs.
You will define BKM, resolve complex issues, and collaborate with internal teams and suppliers to improve metrology capability and process margins. The role requires advanced degree and 5+ or 8+ years in semiconductor lithography, with hands-on metrology expertise and cross-functional leadership across
Competenze
- BS/MS/PhD in Electrical Engineering, Physics, Materials Science, Chemical Engineering, or related field.
- 5+ years (Senior) or 8+ years (Principal) experience in semiconductor photolithography in NP I/HVM manufacturing.
- Strong hands-on experience in photo/overlay metrology engineering (yield, quality, productivity, cost improvement).
- Experience defining and deploying Best Known Methods (BKM) across tools, nodes, or fabs.
Mansioni
- Lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives.
- Resolve complex photo/overlay metrology issues through data-driven RCA.
- Define and deploy photo/overlay metrology BKM across fabs for HVM and NPI.
- Act as technical escalation point and drive cross-fab/node alignment with suppliers.
Conoscenze
Formazione
Strumenti
Descrizione del lavoro
Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, productivity, and cost initiatives across fabs.
You will define BKM, resolve complex issues, and collaborate with internal teams and suppliers to improve metrology capability and process margins. The role requires advanced degree and 5+ or 8+ years in semiconductor lithography, with hands-on metrology expertise and cross-functional leadership across
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