Principal Engineer, Photo Metrology & Overlay (HVM/NPI)

Micron Technology, Inc.; Singapore; On-site; SGD 180,000 - 280,000; Full time

Job summary

Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives.

You will act as the technical authority for resolving complex metrology issues across fabs and drive supplier roadmaps. You will deploy Best Known Methods for HVM and NPI, contribute to cross‑fab and cross‑node alignment, and serve as a key escalation point, collaborating with internal teams and

Qualifications

• BS/MS/PhD in Electrical Engineering, Physics, Materials Science, Chemical Engineering, or related field.
• 5+ years (Senior) or 8+ years (Principal) experience in semiconductor photolithography in NPI/HVM manufacturing.
• Strong hands-on experience in photo/overlay metrology engineering (yield, quality, productivity, cost improvement).
• Proven experience in solving challenges involving overlay, CDU, metrology, reticle correction, MMM, destack, and yield matching.
• Experience defining and deploying Best Known Methods (BKM) across tools, nodes, or fabs.
• Ability to act as a technical point of contact for blocking issues and lead problem solving involving multiple functions.
• Strong data-driven approach and communication skills; comfortable working with global teams and suppliers; flexibility to business travel and overseas assignment.

Responsibilities

• Lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives.
• Resolve complex photo/overlay metrology issues through data‑driven root‑cause analysis.
• Define and deploy photo/overlay metrology Best Known Methods (BKM) across fabs for HVM and NPI.
• Act as the technical point for cross-fab, complex photo/overlay metrology customer concerns.
• Drive MOR–POR gap closure and cross‑fab/node alignment in collaboration with internal teams and suppliers.
• Influence key suppliers and represent OCT in reviews, workshops, and governance forums.
• AI-related responsibilities: Integrate AI-enabled tools into daily work to enhance efficiency and quality.

Skills

Data-driven approach

Global collaboration

Strong communication

Travel flexibility

Education

BS/MS/PhD in Electrical Engineering, Physics, Materials Science, Chemical Engineering, or related field

Tools

Photo metrology tools

Job description

Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives.

You will act as the technical authority for resolving complex metrology issues across fabs and drive supplier roadmaps. You will deploy Best Known Methods for HVM and NPI, contribute to cross‑fab and cross‑node alignment, and serve as a key escalation point, collaborating with internal teams and