Principal Engineer, Photo Metrology & Overlay Engineering

Micron Technology; Singapore; On-site; SGD 140,000 - 210,000; Full time

Job summary

Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, and cost improvement initiatives across fabs.

You will define and deploy Best Known Methods, drive cross‑fab alignment, and serve as a technical escalation point while collaborating with global teams and suppliers.

This role requires 5+ years (Senior) or 8+ years (Principal) in semiconductor photolithography and a strong data-driven approach.

Qualifications

• 5+ years (Senior) or 8+ years (Principal) experience in semiconductor photolithography in NPI/HVM manufacturing.
• Strong hands-on experience in photo/overlay metrology engineering (yield, quality, productivity, cost improvement).
• Experience defining and deploying Best Known Methods (BKM) across tools, nodes, or fabs.
• Ability to act as a technical point of contact for blocking issues and lead problem solving involving multiple functions.

Responsibilities

• Lead HVM photo/overlay metrology yield, quality, productivity, and cost improvement initiatives
• Resolve complex photo/overlay metrology issues through data-driven root-cause analysis
• Define and deploy photo/overlay metrology Best Known Methods (BKM) across fabs for HVM and NPI
• Act as the technical point for cross-fab, complex photo/overlay metrology customer concerns
• Drive MOR–POR gap closure and cross-fab/node alignment in collaboration with internal teams and suppliers
• Influence key suppliers and represent OCT in reviews, workshops, and governance forums
• Integrates AI-assisted tools and insights into daily work to improve efficiency, quality, or effectiveness, exercising sound judgment and complying with organizational standards and legal requirements.
• Contributes to a culture of continuous improvement by identifying, testing, and sharing AI-enabled enhancements within one’s scope of work.
• Ability to apply baseline digital fluency and role-appropriate AI literacy to use AI-enabled tools responsibly and effectively for research, analysis, content creation, problem-solving, operational tasks, and achieving business outcomes.

Skills

Overlay metrology

Data-driven analysis

Cross-functional leadership

Troubleshooting

Education

BS/MS/PhD in EE/Physics/Materials/Chemical Eng

Tools

Metrology tools

Statistical analysis

Job description

Micron Technology, Inc. in Singapore seeks an OCT CPEE Photo Metrology Principal/Senior Engineer to lead HVM photo/overlay metrology yield, quality, and cost improvement initiatives across fabs.

You will define and deploy Best Known Methods, drive cross‑fab alignment, and serve as a technical escalation point while collaborating with global teams and suppliers.

This role requires 5+ years (Senior) or 8+ years (Principal) in semiconductor photolithography and a strong data-driven approach.