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ZEISS Group seeks a qualified engineer to advance flow and pressure architectures in cutting-edge optical metrology systems used for photomask production. You will translate requirements into design specs and employ CFD, 1D, and DSMC modeling to optimize flow, pressure, and contaminant transport.
You will also develop budgets for outgassing/leakage and contribute to purge gas and vacuum system concepts, working with interdisciplinary teams and stakeholders.
ZEISS Semiconductor Manufacturing Technology
Enabler for smaller, more powerful, and more energy-efficient microchips
Working for tomorrow today.
Around 80 percent of all microchips worldwide are produced using ZEISS technologies. As the centerpiece of every electronically controlled system, they have become an integral part of our everyday lives - whether in smartphones, smart homes or smart factories. ZEISS is a technology leader in the field of semiconductor manufacturing equipment. With high-precision lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, increasingly powerful, and more energy-efficient microchips, and thus plays a pivotal role in the age of micro- and nanoelectronics.
To manufacture defect-free photomasks for the latest-generation semiconductor lithography, we develop optical metrology solutions.
The architecture of gas flows within these systems plays a key role in achieving the highest levels of measurement accuracy and system lifetime.
Janina Kalmbach