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Join a forward-thinking company at the forefront of semiconductor technology, where you will lead a team in developing sophisticated algorithms that enhance photomask systems essential for microchip manufacturing. Your expertise in numerics, optimization, and image processing will drive innovation and improve product performance. Collaborate with top-tier research partners and shape the future of algorithm development in a dynamic R&D environment. This role offers a unique opportunity to influence product strategies and optimize processes, making a significant impact in the industry.
Shape the digital future of ZEISS in the Global Algorithms & Software Semiconductor Mask Solutions team!
Your sophisticated algorithms evaluate enormous amounts of image data efficiently. This enables us to enhance the performance of our complex photomask systems, which are essential for manufacturing defect-free microchips.
Our high-tech measurement systems for semiconductor lithography demand exceptional measurement performance, primarily achieved through top-tier optical components. Despite this, manufacturing tolerances pose significant accuracy challenges. Your role is to overcome these limits using advanced algorithms.
You will develop highly accurate mathematical-optical models and numerical solutions within expert teams. Your success will be measured by product maturity and added value of your algorithms. You will also expand your network within the company and collaborate closely with research partners.
As a disciplinary team lead, you will be responsible for the strategic and immediate development of your team, including staffing, technology, and partnerships. You will shape the algorithm development in our R&D department, define roadmaps aligned with product strategies, and optimize organizational processes.