Selective Thin-Film Growth through Surface Chemistry and Passivation

Imec; Vlaams-Brabant; On-site; EUR 13,000 - 20,000; Full time

Job summary

Imec in Belgium seeks a Master internship focused on area-selective deposition through surface chemistry and passivation to enable precise nanoscale patterning in advanced devices.

You will study how surface properties and passivation strategies influence nucleation and growth, with possible deposition and surface characterization tasks.

The project aims to develop understanding and scalable strategies for selective thin-film growth in microfabrication, under Silvia Armini's supervision.

Qualifications

• Master internship in chemistry/chemical engineering, nanoscience, or materials engineering.
• Experience with surface chemistry and passivation is preferred.
• Interest in area-selective deposition and nanoscale patterning.

Responsibilities

• Conduct and support experiments related to area-selective deposition.
• Perform surface characterization and data analysis.
• Assist in evaluating passivation approaches and parameters.

Skills

Surface chemistry

Passivation

Thin-film deposition

Nucleation & growth

Education

Chemistry/Chemical Engineering

Nanoscience & Nanotechnology

Materials Engineering

Job description

/ Selective Thin-Film Growth through Surface Chemistry and Passivation

Selective Thin-Film Growth through Surface Chemistry and Passivation

Engineering Surfaces, Shaping the Future of Deposition

Area-Selective Deposition and Surface Passivation

Area-selective deposition (ASD) is an emerging approach in advanced thin-film fabrication that enables the selective growth of materials on specific regions of a substrate while suppressing deposition on other surfaces. This technique has significant potential for enabling precise nanoscale patterning and simplifying conventional lithography-based processes in the fabrication of next-generation electronic, photonic, and energy-related devices.

This Master’s thesis will investigate the principles and mechanisms underlying area-selective deposition, with particular emphasis on the role of surface chemistry and surface passivation in controlling selective film growth. The project will explore how surface properties, chemical functionalization, and deposition conditions influence the nucleation and growth of thin films on different substrate areas. Surface passivation strategies will be studied to inhibit unwanted deposition on non-growth regions while maintaining favorable conditions for deposition on the target areas.

Depending on the experimental scope, the work may involve thin-film deposition, surface characterization, and analysis of film nucleation and growth. The obtained results will be used to evaluate the effectiveness and limitations of different passivation approaches and to identify the key parameters governing deposition selectivity.

The overall objective of the thesis is to develop a better understanding of the relationship between surface chemistry, passivation, and selective thin-film growth, contributing to the development of reliable and scalable strategies for area-selective deposition in advanced device fabrication.

Type of internship: Master internship

Required educational background: Chemistry/Chemical Engineering, Nanoscience & Nanotechnology, Materials Engineering

Supervising scientist(s): Silvia Armini

The reference code for this position is 2026-INT-265.