Thin-Film Process Development Engineer (ALD/CVD/PVD)

Micron Technology, Inc; Boise (ID); On-site; USD 90,000 - 120,000; Full time

Benefits offered by this job

Medical, dental, and vision plans

Paid time-off program

Paid family leave

Job summary

Micron Technology, Inc in Boise, Idaho is seeking a Metals/Films Process Development Engineer to start up, develop, and optimize processes for product quality and reliability. The role involves problem resolution, process yield improvement, and risk management while collaborating with suppliers.

The ideal candidate should have a Ph.D. in a relevant field and expertise in various thin film deposition techniques. Competitive benefits include medical and wellness programs, paid leave, and growth opportunities.

Qualifications

• Ph.D. in Materials Science, Physics, Chemistry, Chemical Engineering or similar field.
• Experience with thin film deposition and surface analysis techniques.
• Understanding of solid-state physics and materials exploration challenges.

Responsibilities

• Identify and resolve assembly process related problems.
• Lead continuous yield improvement and cost reduction activities.
• Manage material suppliers to achieve quality and risk management objectives.

Skills

Thin film deposition techniques (ALD, CVD, PVD)

Surface analysis techniques (XPS, AFM, XRD)

Solid-state physics

Communication and teamwork

Education

Ph.D. in Materials Science, Physics, Chemistry, Chemical Engineering, or similar

Tools

Statistical analysis software

Job description

Micron Technology, Inc in Boise, Idaho is seeking a Metals/Films Process Development Engineer to start up, develop, and optimize processes for product quality and reliability. The role involves problem resolution, process yield improvement, and risk management while collaborating with suppliers.

The ideal candidate should have a Ph.D. in a relevant field and expertise in various thin film deposition techniques. Competitive benefits include medical and wellness programs, paid leave, and growth opportunities.