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Micron Technology’s Heterogeneous Integration Group (HIG) is leading the development of High Bandwidth Memory (HBM) for AI and ML applications — a breakthrough in semiconductor miniaturization. Leveraging Through Silicon Via (TSV) technology, the team stacks DRAM dies and logic in a single package, achieving unmatched memory density and speed.
This role focuses on nano-enabled reliability engineering to push the limits of advanced FinFET and TSV-based architectures. Lead reliability engineering for cutting-edge HBM products at Micron Technology, Folsom. Collaborate across design, foundry, and R&D teams to assess, model, and optimize nanotechnology-enabled process reliability for FinFET nodes and TSV interconnects.
Responsibilities:
Requirements:
Micron’s HIG team is pushing the frontiers of heterogeneous integration, delivering high-performance High Bandwidth Memory (HBM) solutions for AI/ML workloads that demand extreme memory bandwidth. This is not just incremental semiconductor work — it’s deep nanotechnology-enabled packaging, using TSV to vertically integrate multiple dies for minimal latency and maximum throughput.
What We Offer:
Micron is an equal opportunities employer and welcomes applications from all qualified candidates. We are committed to a diverse and inclusive workplace.