Semiconductor Process Engineer Intern - Optimize & Innovate

GlobalFoundries; Essex Junction (VT); On-site; USD 33,000 - 55,000; Full time

Job summary

GlobalFoundries is seeking process engineering interns for its Fab 9 location in Essex Junction, VT to sustain and run the fab floor, resolving equipment and process issues. You will lead an intern project and present results at year-end poster session.

The internship requires sophomore status in chemical engineering or related field, a 3.0+ GPA, English proficiency, and a 40-hour work week commitment. Prior related experience is a plus and strong communication is essential.

Qualifications

• Education – A sophomore at time of application and actively pursuing a Bachelor’s Degree in Chemical Engineering, Material Science Engineering, or related field.
• Must have at least an overall 3.0 GPA and be in good academic standing.
• Language Fluency - English (Written & Verbal)
• Ability to work at least 40 hours per week during the internship.

Responsibilities

• Establish and manage the equipment quality control plan.
• Drive continuous improvement efforts in throughput, cost reduction and yield learning.
• Define and maintain equipment installation process qualification or installation roadmaps.
• Design, execute, and analyze experiments to screen and optimize manufacturing processes.

Skills

English fluency

Communication skills

Leadership experience

Project management

Education

Bachelor's degree in Chemical Engineering or related field

GPA 3.0 or higher

Tools

SPC

DOE

Job description

GlobalFoundries is seeking process engineering interns for its Fab 9 location in Essex Junction, VT to sustain and run the fab floor, resolving equipment and process issues. You will lead an intern project and present results at year-end poster session.

The internship requires sophomore status in chemical engineering or related field, a 3.0+ GPA, English proficiency, and a 40-hour work week commitment. Prior related experience is a plus and strong communication is essential.