Remote Equipment Engineer — High-NA EUV Track

Micron Technology, Inc

Boise (ID)

Remote

USD 90,000 - 154,000

Full time

14 days+

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Benefits offered by this job

Medical, dental, and vision plans
Paid family leave
Paid time-off and holidays

Job summary

Micron Technology, Inc is seeking a High NA EUV Track - Equipment Engineer to lead the installation, optimization, and maintenance of advanced photolithography equipment. This role focuses on ensuring flawless process integration and includes responsibilities like developing photolithography track recipes and collaborating on technology scaling. Candidates should have a Master's degree and 4 years of relevant experience. The position offers a competitive salary range of $90,000 - $154,000, depending on qualifications and location.

Qualifications

  • 4 years of experience in photolithography track equipment development and maintenance.
  • Proven ability to troubleshoot mechanical systems and interpret complex schematic diagrams.

Responsibilities

  • Lead equipment hardware projects and installations, ensuring process integration.
  • Develop and optimize advanced photolithography track recipes to meet performance targets.
  • Evaluate new photo film materials and equipment configurations for technology scaling.

Skills

Expertise with High NA EUV Photo Track hardware
Troubleshooting mechanical systems
Failure analysis methodologies (FMEA, 8D, SPC/FDC)

Education

Master’s degree in Engineering or a related technical field

Job description

Micron Technology, Inc is seeking a High NA EUV Track - Equipment Engineer to lead the installation, optimization, and maintenance of advanced photolithography equipment. This role focuses on ensuring flawless process integration and includes responsibilities like developing photolithography track recipes and collaborating on technology scaling. Candidates should have a Master's degree and 4 years of relevant experience. The position offers a competitive salary range of $90,000 - $154,000, depending on qualifications and location.
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