Principal Engineer Lead - Track and Trim Equipment Dev

Micron Technology

Boise (ID)

Vor Ort

USD 120.000 - 160.000

Vollzeit

14 Tage+

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Zusammenfassung

Micron Technology in Boise, Idaho, is seeking a technical leader in photolithography Track and Trim systems. This role requires excellent collaboration to define process strategy and resolve complex challenges in advanced semiconductor manufacturing.

The ideal candidate will have a Bachelor’s degree in Engineering and over 10 years of experience in semiconductor equipment development, demonstrating strong expertise in photolithography systems.

Qualifikationen

  • 10+ years of semiconductor equipment and/or process development experience.
  • Deep expertise in photolithography Track systems.
  • Experience with Trim processes in photolithography.

Aufgaben

  • Define process strategy and resolve complex equipment and process issues.
  • Lead equipment lifecycle programs for advanced nodes including EUV.
  • Improve tool uptime, reliability, and performance to meet yield and cost targets.

Kenntnisse

Photolithography expertise
Technical program leadership
Collaboration and communication skills

Ausbildung

Bachelor’s degree in Engineering or related field
Advanced degree in technical or engineering-related field

Jobbeschreibung

Our vision is to transform how the world uses information to enrich life for all.

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.

We are the Track & Trim Equipment Development Engineering team, driving innovation at the heart of advanced semiconductor manufacturing. We partner across process, integration, and manufacturing teams to bring next‑generation lithography capabilities—including EUV—to life. If you enjoy solving complex technical challenges and crafting the future of high‑volume manufacturing, you’ll feel right at home here!

In this role, you will serve as a technical leader and recognized authority on photolithography Track and Trim systems. You’ll lead critical programs, influence process strategy, and ensure equipment performance at advanced nodes. Your work will directly impact yield, cost, and scalability throughout international fabrication facilities, making this a highly visible and rewarding opportunity.

Responsibilities
  • Serve as SME for Track & Trim systems; define process strategy and resolve complex equipment and process issues
  • Lead equipment lifecycle programs including selection, installation, qualification, and deployment for advanced nodes including EUV
  • Improve tool uptime, reliability, and performance to meet yield and cost targets in high‑volume manufacturing
  • Drive safety and operational perfection by embedding safe practices (PPE, LOTO, chemical safety) into equipment and processes
  • Partner with multi‑functional teams and vendors to develop, optimize, and scale solutions across global fabs
Minimum Qualifications
  • Bachelor’s degree in Engineering or a related field, or equivalent experience in the field
  • 10+ years of semiconductor equipment and/or process development experience
  • Deep expertise in photolithography Track systems
  • Proven track record leading complex technical programs and solving advanced equipment/process challenges
  • Tight‑knit collaboration, communication, and influencing skills across global teams
Preferred Qualifications
  • Experience with Trim processes in photolithography
  • Experience supporting or developing EUV technology
  • Advanced degree or equivalent experience in a technical or engineering‑related field
  • Experience improving equipment performance in high‑volume manufacturing environments
  • Demonstrated ability to work closely with vendors and drive joint innovation

Micron is proud to be an equal opportunity workplace and an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.

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