Postdoctoral Fellow (PREP0004308)

Johns Hopkins University

Gaithersburg (MD)

Presencial

USD 70.000 - 90.000

Jornada completa

14 días+
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Descripción de la vacante

Johns Hopkins University is seeking a PREP Research Associate based in Gaithersburg, Maryland. The role involves conducting research while collaborating with multidisciplinary teams at NIST to support the EUV lithographic community.

Candidates must possess a Ph.D. in relevant fields and have experience with optical metrology and beamline operations. Strong communication skills are essential. The project promotes innovative research and systemic advancements in lithography.

Formación

  • Ph.D. in physics, Engineering, or a related field.
  • Experience with optical metrology instrument and detector design.
  • Experience with EUV lithography and synchrotron beamline operations.

Responsabilidades

  • Conduct literature review of EUV multilayer mirror technology.
  • Operate, maintain, and upgrade beamline 7.
  • Develop roadmap for EUV reflectometry reference standard.
  • Interact with staff to design components using CAD software.

Conocimientos

Optical metrology instrument and detector design
EUV lithography
Synchrotron beamline operations
Ultra-high vacuum systems and practices
X-ray and/or EUV instruments
Data acquisition hardware and software (LabVIEW and Python)
CAD software
Statistical data analysis

Educación

Ph.D. in physics, Engineering, or a related field

Descripción del empleo

General Description

PREP Research Associate

CHIPS Funded Project.

This position is part of the National Institute of Standards and Technology (NIST) Professional Research Experience Program (PREP). NIST recognizes that its research staff may want to collaborate with researchers at academic institutions on specific projects of mutual interest and, therefore, requires those institutions to be recipients of a PREP award. The PREP program involves staff from a wide range of backgrounds conducting scientific research across various fields. Individuals in this position will perform technical work supporting the collaboration's scientific research.

Research Title: Postdoctoral beamline Scientist

The work will entail:

The NIST SURF III team operates an Extreme Ultraviolet (EUV) reflectometry facility on an established beamline making scores of measurements per year. This mature facility is undergoing a complete replacement through a collaboration with Lawrence Berkeley Laboratory's Center for X-ray Optics. The upgraded facility will provide improved capabilities, uncertainty, reliability and throughput to meet the growing need of the EUV lithographic (EUVL) industry. The successful candidate will work with an interdisciplinary team to operate, maintain, upgrade and commission the SURF III EUV reflectometry facility (beamline 7). Research will include development of a roadmap for an EUV reflectance standard to be used by the EUVL community.

U.S. Citizen Preferred

Key Responsibilities
  • Conduct literature review of EUV multilayer mirror technology, EUV reference standards and develop report based on review.
  • Work with a multidisciplinary team to operate, maintain and upgrade beamline 7.
  • Work with Staff to develop roadmap for EUV reflectometry reference standard.
  • Interact with NIST and partner institution staff to develop mechanical design of components for an ultra-high vacuum synchrotron end-station using CAD software.
  • Run, optimize, and document data acquisition codes (LabVIEW and Python).
  • Aid NIST staff in developing plans for beamline removal of legacy hardware and integration of new systems onto SURF III beamline 7.
  • Prepare written reports and documentation for sample measurement, operation of instrumentation and safety.
  • Provide input for CHIPS quarterly progress reports.
Qualifications
  • Ph.D. in physics, Engineering, or a related field.
  • Experience with the following:
    • Optical metrology instrument and detector design.
    • EUV lithography.
    • Synchrotron beamline operations.
    • Ultra-high vacuum systems and practices.
    • X-ray and/or EUV instruments.
    • Use and development of data acquisition hardware and software (LabVIEW and Python).
    • Familiarity with CAD software.
    • Statistical data analysis.
  • Strong oral and written communication skills.
Equal Opportunity Employer

The Johns Hopkins University is committed to equal opportunity for its faculty, staff, and students. To that end, the university does not discriminate on the basis of sex, gender, marital status, pregnancy, race, color, ethnicity, national origin, age, disability, religion, sexual orientation, gender identity or expression, veteran status or other legally protected characteristic. The university is committed to providing qualified individuals access to all academic and employment programs, benefits and activities on the basis of demonstrated ability, performance and merit without regard to personal factors that are irrelevant to the program involved.

EEO is the Law

https://www.eeoc.gov/sites/default/files/2023-06/22-088_EEOC_KnowYourRights6.12ScreenRdr.pdf

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