Photomask Inspection & Process Engineer (EUV/ADC)

Micron Technology; Boise (ID); On-site; USD 85,000 - 130,000; Full time

Job summary

Micron Technology Center (MTC) seeks a Photomask Inspection Engineer / Process Engineer to start up, develop, optimize, and sustain reticle inspection processes ensuring zero printing defects and shipment accuracy. The role emphasizes EUV reticle inspection, ADC, defect avoidance, and data-driven improvements across lithography roadmaps.

The candidate will collaborate with R&D, FEOL, HVM, sustaining engineering, and manufacturing teams, lead yield and cost-reduction initiatives, and mentor staff

Qualifications

• Bachelor’s degree or higher in Engineering, Physics, Optics, or Mathematics.
• Minimum of 2+ years of experience in reticle pattern inspection or wafer inspection (RDA).
• Experience optimizing inspection sensitivities to ensure defect detection and zero printing defects.
• Experience developing, tuning, and optimizing ADC (Automatic Defect Classification) systems and algorithms.
• Strong competency in systematic problem-solving techniques (e.g., MBPS, RCA) with excellent written and verbal communication skills.

Responsibilities

• Start up, develop, optimize, and sustain photomask inspection processes including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning to ensure zero printing defects and shipment errors.
• Identify, diagnose, and resolve process-related manufacturing issues using systematic problem-solving methodologies such as Failure Analysis, FMEA, 8D, MBPS, RCA, SPC/FDC, and statistical data analysis.
• Lead and participate in continuous yield improvement, cost reduction, productivity improvement, automation, and efficiency initiatives to improve KPIs such as First Time Success Rate, nuisance/false alarm reduction, equipment availability, and RPT.
• Monitor tool health, SPC performance, inspection results, and respond to trends or out-of-spec (OOS) process and equipment conditions.
• Research, develop, implement, and qualify new inspection processes, techniques, sensitivities, models, and baselines to support Micron’s reticle, EUV, pellicle, and High-NA lithography roadmaps.
• Collaborate closely with R&D, FEOL, HVM, sustaining engineering, manufacturing, and inspection process/equipment engineering teams to support defect analysis, printability assessment (including Actinic images and WPC), and data-driven decision making.
• Engage with inspection tool, software, equipment, and material suppliers to evaluate, qualify, audit, and improve current and next-generation capital equipment, ADC algorithms, materials, and inspection capabilities while meeting quality, cost, ROI, and risk objectives.
• Provide technical leadership by mentoring and training manufacturing personnel and engineers. Offer authoritative insight into tool and process capabilities and appropriate data collection techniques. Use AI tools to improve efficiency.

Skills

Reticle inspection

Problem solving

Data analysis

Communication skills

AI tools

Education

Bachelor’s degree in Engineering/Physics/Optics/Math

Tools

ADC systems

EUV reticle inspection tools

Job description

Micron Technology Center (MTC) seeks a Photomask Inspection Engineer / Process Engineer to start up, develop, optimize, and sustain reticle inspection processes ensuring zero printing defects and shipment accuracy. The role emphasizes EUV reticle inspection, ADC, defect avoidance, and data-driven improvements across lithography roadmaps.

The candidate will collaborate with R&D, FEOL, HVM, sustaining engineering, and manufacturing teams, lead yield and cost-reduction initiatives, and mentor staff