EUV Reticle Inspection Process Engineer

1000 Micron Technology, Inc.; Boise (ID); On-site; USD 90,000 - 140,000; Full time

Benefits offered by this job

Medical, dental and vision plans

Paid time off

Paid holidays

Paid family leave

Job summary

Micron Technology, a global leader in memory and storage, seeks a Photomask Inspection Engineer / Process Engineer at the Micron Technology Center to start up, develop, and sustain reticle inspection processes, focusing on EUV inspection, ADC, defect avoidance, and data-driven improvements to meet stringent quality and yield targets.

You will collaborate with R&D, FEOL, HVM, and manufacturing teams, using systematic problem solving and advanced analytics to drive continuous yield improvement and

Qualifications

• Bachelor's degree or higher in Engineering, Physics, Optics, or Mathematics.
• Minimum 2+ years of experience in reticle pattern inspection or wafer inspection (RDA).
• Experience optimizing inspection sensitivities to ensure defect detection and zero printing defects.
• Experience developing, tuning, and optimizing ADC (Automatic Defect Classification) systems and algorithms.

Responsibilities

• Start up, develop, optimize, and sustain photomask inspection processes including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning to ensure zero printing defects and shipment errors.
• Identify, diagnose, and resolve process-related manufacturing issues using systematic problem-solving methodologies such as Failure Analysis, FMEA, 8D, MBPS, RCA, SPC/FDC, and statistical data analysis.
• Lead and participate in continuous yield improvement, cost reduction, productivity improvement, automation, and efficiency initiatives to improve KPIs such as First Time Success Rate, nuisance/false alarm reduction, equipment availability, and RPT.
• Monitor tool health, SPC performance, inspection results, and respond to trends or out-of-spec (OOS) process and equipment conditions.
• Research, develop, implement, and qualify new inspection processes, techniques, sensitivities, models, and baselines to support Micron’s reticle, EUV, pellicle, and High-NA lithography roadmaps.
• Collaborate closely with R&D, FEOL, HVM, sustaining engineering, manufacturing, and inspection process/equipment engineering teams to support defect analysis, printability assessment (including Actinic images and WPC), and data-driven decision making.

Skills

Reticle inspection

ADC systems

Problem solving

Data analysis

Education

Bachelor's degree or higher in Engineering/Physics/Optics/Math

Job description

Micron Technology, a global leader in memory and storage, seeks a Photomask Inspection Engineer / Process Engineer at the Micron Technology Center to start up, develop, and sustain reticle inspection processes, focusing on EUV inspection, ADC, defect avoidance, and data-driven improvements to meet stringent quality and yield targets.

You will collaborate with R&D, FEOL, HVM, and manufacturing teams, using systematic problem solving and advanced analytics to drive continuous yield improvement and